Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGMT | P16455 | 4/20 | 0.53 |
| ▸ | CDK1 | P06493 | 2/20 | 0.53 |
| ▸ | CCNB1 | P14635 | 2/20 | 0.53 |
| ▸ | CCNA2 | P20248 | 2/20 | 0.53 |
| ▸ | CDK2 | P24941 | 2/20 | 0.53 |
| ▸ | CCNA1 | P78396 | 2/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | RAB9A | P51151 | 2/20 | 0.52 |
| ▸ | NPC1 | O15118 | 1/20 | 0.52 |
| ▸ | DCPS | Q96C86 | 1/20 | 0.51 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | MAOB | P27338 | 2/20 | 0.50 |
| ▸ | MPO | P05164 | 1/20 | 0.50 |
| ▸ | TPO | P07202 | 1/20 | 0.50 |
| ▸ | EPX | P11678 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | MAOA | P21397 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11009131 | 0.85 | TSHR (0.52) | SMN1; SMN2RAB9ACYP3A4GAAL3MBTL1 | |
| SCHEMBL16852229 | 0.78 | MGMT (0.64) | MGMTCDK1CCNB1CCNA2CDK2 | |
| SCHEMBL11324668 | 0.76 | LMNA (0.52) | SMN1; SMN2RAB9AGAAL3MBTL1MAOB | |
| SCHEMBL17066147 | 0.76 | L3MBTL1 (0.51) | SMN1; SMN2RAB9AGAAL3MBTL1MAOB | |
| SCHEMBL17010218 | 0.76 | MAOB (0.55) | MGMTCDK1CCNB1CCNA2CDK2 | |
| SCHEMBL23406246 | 0.76 | ALOX5 (0.44) | SMN1; SMN2RAB9ACYP3A4GAAL3MBTL1 | |
| SCHEMBL16253511 | 0.76 | L3MBTL1 (0.51) | SMN1; SMN2RAB9AGAAL3MBTL1MAOB | |
| SCHEMBL4270551 | 0.76 | NUDT1 (0.51) | SMN1; SMN2NUDT1CYP3A4GAAL3MBTL1 | |
| SCHEMBL22686879 | 0.76 | PIN1 (0.45) | SMN1; SMN2RAB9ANUDT1CYP3A4GAA | |
| SCHEMBL578063 | 0.76 | PIN1 (0.49) | SMN1; SMN2RAB9ACYP3A4GAAL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 330 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101981122-B | Polyacetal resin composition | MITSUBISHI GAS CHEMICAL CO | 2013-05-15 | — | — | CN | claimed |
| US-6303604-B1 | USED AS ANTINEOPLASTIC ALKYLATING AGENT WHICH CAUSES CYTOTOXIC LESIONS AT THE O.SUP.6-POSITION OF QUANINE | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE DEPARTMENT OF HEALTH AND HUMAN SERVICES | 2001-10-16 | — | — | US | claimed |
| US-6384179-B1 | — | — | None | — | — | US | disclosed |
| US-20250360691-A1 | RELEASE FILM AND LAMINATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250333609-A1 | HYDROPHILIC COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-30 | — | — | US | disclosed |
| EP-3431520-B1 | PROCESS FOR PRODUCING OXYMETHYLENE COPOLYMER | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-09-24 | — | — | EP | disclosed |
| WO-2025089072-A1 | POLYACETAL RESIN COMPOSITION | ポリプラスチックス株式会社 | 2025-05-01 | — | — | WO | disclosed |
| WO-2025089071-A1 | POLYACETAL RESIN COMPOSITION | ポリプラスチックス株式会社 | 2025-05-01 | — | — | WO | disclosed |
| CN-118055976-B | Polyacetal resin composition | 宝理塑料株式会社 | 2025-04-11 | — | — | CN | disclosed |
| EP-4534598-A1 | HYDROPHILIC COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-118055975-B | Polyacetal resin composition | 宝理塑料株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-1009106-B | STABILIZED OXYMETHYLENE POLYMERS | CELANESE CORP (US) | 1990-08-08 | — | — | CN | disclosed |
| EP-0289142-A2 | Polyacetal molding compositions | HOECHST CELANESE CORPORATION (US) | 1988-11-02 | — | — | EP | disclosed |
| US-4751272-A | POLYMERIZING TRIOXANE AND CYCLIC ETHER; BORON TRIFLUORIDE CATALYST | TORAY INDUSTRIES, INC. (JP) | 1988-06-14 | — | — | US | disclosed |
| EP-0244245-A2 | Process for producing oxymethylene copolymer and resinous composition | TORAY INDUSTRIES, INC. (JP) | 1987-11-04 | — | — | EP | disclosed |
| CN-87100470-A | Stable yuban | — | 1987-10-28 | — | — | CN | disclosed |
| US-4578422-A | POLYCYANATE, AMINOTRIAZINE OR CYANOGUANIDINE, GLASS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1986-03-25 | — | — | US | disclosed |
| US-4526921-A | Acetal resin, low molecular weight polycarbonate | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1985-07-02 | — | — | US | disclosed |
| US-4506053-A | BNLEND WITH POLYCYANURATES, AMINE SUBSTITUTED TRIAZINE AND/OR CYANOGUANIDINE, AND FILLER | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 1985-03-19 | — | — | US | disclosed |
| US-4342680-A | WITH AN AMINE SUBSTITUTED TRIAZINE, A PHENOL, AND AN ALKALI METAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1982-08-03 | — | — | US | disclosed |