Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 known ✓ | O00255 | 1/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.67 |
| ▸ | CA5A | P35218 | 1/20 | 0.46 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL16430834 | 1.00 | MEN1 (0.67) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL3597571 | 1.00 | MEN1 (0.67) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL2019827 | 1.00 | MEN1 (0.67) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL2587823 | 1.00 | MEN1 (0.67) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL2590832 | 0.94 | MEN1 (0.75) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL28398822 | 0.94 | MEN1 (0.75) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL10566608 | 0.94 | MEN1 (0.75) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL28478211 | 0.94 | MEN1 (0.75) | MEN1KMT2ACA5ACA5BTSHR | |
| SCHEMBL887970 | 0.94 | MEN1 (0.75) | MEN1KMT2ACA5ACA5BTSHR | |
| Water SCHEMBL708617 | 0.94 | MEN1 (0.75) | MEN1KMT2ACA5ACA5BTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4678599-A1 | COMPOUND, COMPOUND PARTICLES, NEAR-INFRARED TRANSMISSION MATERIAL, AND NEAR-INFRARED TRANSMISSION FILM | Mitsui Mining & Smelting Co., Ltd (JP) | 2026-01-14 | — | — | EP | disclosed |
| CN-112514078-B | Coating liquid for forming metal oxide film, oxide insulator film, field effect transistor, display element, image display device, and system | 株式会社理光 | 2025-02-11 | — | — | CN | disclosed |
| WO-2024190676-A1 | COMPOUND, COMPOUND PARTICLES, NEAR-INFRARED TRANSMISSION MATERIAL, AND NEAR-INFRARED TRANSMISSION FILM | 三井金属鉱業株式会社 | 2024-09-19 | — | — | WO | disclosed |
| EP-4391083-A2 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | Ricoh Company, Ltd. (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3350839-B1 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | RICOH CO LTD (JP) | 2024-06-12 | — | — | EP | disclosed |
| EP-3550595-B1 | COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM AND A METHOD FOR MANUFACTURING USING THE COATING LIQUID | RICOH CO LTD (JP) | 2024-04-10 | — | — | EP | disclosed |
| US-11908945-B2 | Coating liquid for forming n-type oxide semiconductor film, method for producing n-type oxide semiconductor film, and method for producing field-effect transistor | RICOH COMPANY, LTD. (JP) | 2024-02-20 | — | — | US | disclosed |
| US-11901431-B2 | Coating liquid for forming metal oxide film, oxide insulator film, field-effect transistor, display element, image display device, and system | RICOH COMPANY, LTD. (JP) | 2024-02-13 | — | — | US | disclosed |
| CN-110024089-B | Oxide or oxynitride insulator film, coating liquid for forming the same, field effect transistor, and method for manufacturing the same | 株式会社理光 | 2023-06-27 | — | — | CN | disclosed |
| US-11502203-B2 | Coating liquid for forming metal oxide film, oxide film, field-effect transistor, and method for producing the same | RICOH COMPANY, LTD. (JP) | 2022-11-15 | — | — | US | disclosed |
| EP-3599646-A2 | METAL OXIDE, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME | Ricoh Company, Ltd. (JP) | 2020-01-29 | — | — | EP | disclosed |
| CN-110431656-A | Coating liquid for forming metal oxide film, field effect transistor and method for producing the same | RICOH CO LTD | 2019-11-08 | — | — | CN | disclosed |
| EP-3550595-A1 | COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM, OXIDE OR OXYNITRIDE INSULATOR FILM, FIELD EFFECT TRANSISTOR, AND METHODS FOR MANUFACTURING THESE | Ricoh Company, Ltd. (JP) | 2019-10-09 | — | — | EP | disclosed |
| US-20190280098-A1 | COATING LIQUID FOR FORMING OXIDE OR OXYNITRIDE INSULATOR FILM, OXIDE OR OXYNITRIDE INSULATOR FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING THE SAME | RICOH COMPANY, LTD. (JP) | 2019-09-12 | — | — | US | disclosed |
| CN-110024089-A | Coating liquid for forming oxide or oxynitride insulator film, field effect transistor, and method for producing these | 株式会社理光 | 2019-07-16 | — | — | CN | disclosed |
| US-20190051752-A1 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | RICOH COMOANY, LTD. (JP) | 2019-02-14 | — | — | US | disclosed |
| EP-3350839-A1 | COATING LIQUID FOR FORMING N-TYPE OXIDE SEMICONDUCTOR FILM, METHOD FOR PRODUCING N-TYPE OXIDE SEMICONDUCTOR FILM, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | Ricoh Company, Ltd. (JP) | 2018-07-25 | — | — | EP | disclosed |
| CN-108028270-A | For forming coating fluid, n-type oxide semiconductor film manufacture method and the manufacturing method for field effect transistor of n-type oxide semiconductor film | 株式会社理光 | 2018-05-11 | — | — | CN | disclosed |
| US-20170162704-A1 | FIELD-EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM | RICOH COMPANY, LTD. (JP) | 2017-06-08 | — | — | US | disclosed |
| US-6017442-A | Hydrocarbon conversion with dual metal promoted zeolite | PHILLIPS PETROLEUM COMPANY (US) | 2000-01-25 | — | — | US | disclosed |