Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.62 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.57 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.57 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.57 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.57 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.57 |
| ▸ | MEN1 | O00255 | 1/20 | 0.57 |
| ▸ | SLC16A3 | O15427 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.57 |
| ▸ | TTR | P02766 | 1/20 | 0.57 |
| ▸ | TP53 | P04637 | 1/20 | 0.57 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.57 |
| ▸ | POLB | P06746 | 1/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.57 |
| ▸ | GAA | P10253 | 1/20 | 0.57 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Letestuianin C SCHEMBL4410123 | 0.91 | F2RL1 (0.60) | ESR1ESR2KDM4ECYP19A1ALDH1A1 | |
| SCHEMBL1053043 | 0.89 | IAPP (0.66) | ESR1ESR2KDM4ECYP19A1ALDH1A1 | |
| SCHEMBL452806 | 0.89 | TDP1 (0.59) | ESR1ESR2KDM4ECYP19A1ALDH1A1 | |
| SCHEMBL107381 | 0.87 | IAPP (0.65) | ESR1ESR2KDM4ECYP19A1ALDH1A1 | |
| SCHEMBL27921443 | 0.86 | IAPP (0.68) | ESR1ESR2KDM4EALDH1A1CYP2C19 | |
| SCHEMBL21203290 | 0.86 | IAPP (0.72) | ESR1KDM4ECYP19A1ALDH1A1CYP2C19 | |
| SCHEMBL7753254 | 0.86 | ESR1 (0.56) | ESR1ESR2KDM4EALDH1A1HDAC2 | |
| SCHEMBL2862583 | 0.85 | MMP12 (0.68) | ESR1ESR2KDM4ECYP19A1ALDH1A1 | |
| SCHEMBL26751575 | 0.84 | F2RL1 (0.74) | ESR2ALDH1A1KMT2AMEN1POLB | |
| SCHEMBL1697201 | 0.84 | TRPV1 (0.54) | ESR1ESR2KDM4ECYP19A1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117024880-B | High-temperature-resistant plastic-wood material composition and plastic-wood product | 美新科技股份有限公司 | 2024-05-24 | — | — | CN | claimed |
| CN-117024880-A | High-temperature-resistant plastic-wood material composition and plastic-wood product | 美新科技股份有限公司 | 2023-11-10 | — | — | CN | claimed |
| CN-107162999-B | Synthetic method of 2-phenyl-4-p-hydroxyphenyl thiazole | 淮海工学院 | 2022-06-10 | — | — | CN | claimed |
| CN-117024880-B | High-temperature-resistant plastic-wood material composition and plastic-wood product | 美新科技股份有限公司 | 2024-05-24 | — | — | CN | disclosed |
| CN-117024880-A | High-temperature-resistant plastic-wood material composition and plastic-wood product | 美新科技股份有限公司 | 2023-11-10 | — | — | CN | disclosed |
| US-20230152695-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152695-A1 | RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| CN-107162999-B | Synthetic method of 2-phenyl-4-p-hydroxyphenyl thiazole | 淮海工学院 | 2022-06-10 | — | — | CN | disclosed |
| CN-113440440-B | Skin barrier repair composition and preparation method and application thereof | 宝萃生物科技有限公司 | 2022-06-07 | — | — | CN | disclosed |
| CN-113440440-A | Skin barrier repair composition and preparation method and application thereof | 宝萃生物科技有限公司 | 2021-09-28 | — | — | CN | disclosed |
| CN-112294671-A | Baby liquid talcum powder and preparation method thereof | 无锡戴可思生物科技有限公司 | 2021-02-02 | — | — | CN | disclosed |
| JP-2000169323-A | SKIN BEAUTIFYING COSMETIC | KANEBO LTD | 2000-06-20 | — | — | JP | disclosed |
| EP-0530148-B1 | Positive photo resist with increased dissolving power and reduced crystallisation tendency as well as new tetra(hydroxyphenyl)alkane | OLIN MICROELECTRONIC CHEM INC (US) | 1998-12-23 | — | — | EP | disclosed |
| US-5668146-A | ANTIINFLAMMATORY AGENTS OR ANTIALLERGENS | ABBOTT LABORATORIES (US) | 1997-09-16 | — | — | US | disclosed |
| US-5554797-A | ENHANCE PHOTOSENSITIVITY AND/OR RATE OF DEVELOPMENT OF PHOTORESISTS | OCG MICROELECTRONIC MATERIALS, INC. (US) | 1996-09-10 | — | — | US | disclosed |
| US-5436098-A | Multilayer element with quinone diazide, resin and aromatic hydroxy compound for relief images | CIBA-GEIGY CORPORATION (US) | 1995-07-25 | — | — | US | disclosed |
| US-5296330-A | Resolution, amorphous | CIBA-GEIGY CORP. (US) | 1994-03-22 | — | — | US | disclosed |
| EP-0530148-A1 | Positive photo resist with increased dissolving power and reduced crystallisation tendency as well as new tetra(hydroxyphenyl)alkane | OCG Microelectronic Materials Inc. (US) | 1993-03-03 | — | — | EP | disclosed |
| US-4552876-A | ANTIALLERGENS, ANTIINFLAMMATORY AGENTS | USV PHARMACEUTICAL CORP. (US) | 1985-11-12 | — | — | US | disclosed |
| US-4042587-A | PESTICIDES | BASF AKTIENGESELLSCHAFT (DT) | 1977-08-16 | — | — | US | disclosed |