SCHEMBL825663

SCHEMBL825663

CCC(C)c1ccc(OCOc2ccc3ccc(O)cc3c2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
TSHR P16473 1/20 0.48
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
AKR1C3 P42330 1/20 0.42
AKR1C2 P52895 1/20 0.42
KMT2A Q03164 2/20 0.41
MEN1 O00255 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
HSP90AA1 P07900 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
CYP2C9 P11712 2/20 0.40
HSD17B10 Q99714 2/20 0.40
ABCB11 O95342 1/20 0.39
GAA P10253 2/20 0.38
CYP17A1 P05093 1/20 0.38
CYP2C19 P33261 1/20 0.38
MAPT P10636 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825656 0.86 ABCB11 (0.51) ALDH1A1TSHRRAB9AAKR1C3AKR1C2
SCHEMBL825353 0.85 ALDH1A1 (0.49) ALDH1A1TSHRNPC1RAB9AAKR1C3
SCHEMBL10224687 0.80 HSD17B10 (0.51) ALDH1A1TDP1ESR1ESR2CYP2C9
SCHEMBL11113379 0.80 ALDH1A1 (0.62) ALDH1A1TSHRNPC1RAB9AKMT2A
SCHEMBL18350082 0.79 HSD17B10 (0.51) ALDH1A1TSHRAKR1C3AKR1C2TDP1
SCHEMBL2740765 0.79 HSD17B10 (0.51) ALDH1A1TSHRAKR1C3AKR1C2TDP1
SCHEMBL86085 0.78 HSD17B10 (0.54) ALDH1A1TSHRAKR1C3AKR1C2TDP1
SCHEMBL11999045 0.78 AKR1C3 (0.48) ALDH1A1TSHRNPC1RAB9AAKR1C3
SCHEMBL14118314 0.78 SLC6A2 (0.46) ALDH1A1TSHRNPC1RAB9AAKR1C3
SCHEMBL825545 0.77 ALDH1A1 (0.45) ALDH1A1TSHRNPC1RAB9AAKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed