SCHEMBL825545

SCHEMBL825545

CCC(C)c1ccc(OCOc2ccc3cccc(O)c3c2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.45
TSHR P16473 2/20 0.45
TP53 P04637 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
HDAC4 P56524 1/20 0.43
HDAC2 Q92769 1/20 0.43
HDAC8 Q9BY41 1/20 0.43
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
GAA P10253 2/20 0.38
USP2 O75604 1/20 0.38
PKM P14618 1/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
HSD17B10 Q99714 1/20 0.38
CTDSP1 Q9GZU7 1/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
AKR1C3 P42330 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13683030 0.84 ALDH1A1 (0.41) ALDH1A1TSHRTP53SMN1; SMN2MEN1
SCHEMBL825353 0.82 ALDH1A1 (0.49) ALDH1A1TSHRTP53SMN1; SMN2MEN1
SCHEMBL18350071 0.82 HDAC4 (0.57) ALDH1A1TSHRHDAC4HDAC2HDAC8
SCHEMBL825488 0.79 ALDH1A1 (0.47) ALDH1A1TSHRTP53SMN1; SMN2HDAC4
SCHEMBL825663 0.77 ALDH1A1 (0.48) ALDH1A1TSHRTP53SMN1; SMN2MEN1
SCHEMBL825531 0.77 KCNA3 (0.47) ALDH1A1TSHRTP53SMN1; SMN2HSD17B10
SCHEMBL18350080 0.77 HDAC4 (0.51) ALDH1A1TSHRHDAC4HDAC2HDAC8
SCHEMBL11113379 0.77 ALDH1A1 (0.62) ALDH1A1TSHRSMN1; SMN2MEN1KMT2A
SCHEMBL825487 0.75 ALDH1A1 (0.48) ALDH1A1TSHRSMN1; SMN2MEN1KMT2A
SCHEMBL825483 0.75 ALDH1A1 (0.48) ALDH1A1TSHRTP53SMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed