SCHEMBL826744

SCHEMBL826744

C=CCOc1ccc(C(=O)c2ccc(OCC=C)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.56
MAPT P10636 2/20 0.56
RAB9A P51151 2/20 0.56
POLB P06746 1/20 0.56
SMN1; SMN2 Q16637 1/20 0.56
CHRNB2 P17787 4/20 0.54
CHRNB4 P30926 4/20 0.54
CHRNA3 P32297 4/20 0.54
CHRNA4 P43681 4/20 0.54
LSS P48449 2/20 0.54
CA12 O43570 1/20 0.53
CA1 P00915 1/20 0.53
CA2 P00918 1/20 0.53
CA7 P43166 1/20 0.53
CA9 Q16790 1/20 0.53
ALDH1A1 P00352 2/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
ADRB2 P07550 1/20 0.49
ADRB1 P08588 1/20 0.49
ADRB3 P13945 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2972344 0.93 GAA (0.60) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL3417115 0.93 MAPT (0.52) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL1819518 0.91 LSS (0.56) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL6883338 0.91 HPGD (0.54) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL18766371 0.88 NPC1 (0.56) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL24890713 0.86 NPC1 (0.55) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL28451501 0.86 NPC1 (0.55) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL1489146 0.86 ALDH1A1 (0.67) NPC1MAPTRAB9APOLBSMN1; SMN2
SCHEMBL3018361 0.85 PARP10 (0.59) NPC1MAPTRAB9APOLBSMN1; SMN2
Hydrochloric Acid SCHEMBL711176 0.85 ALDH1A1 (0.65) NPC1MAPTRAB9APOLBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8143362-B2 Composition containing unsaturated silicone compounds, dental materials containing them and use thereof 3M INNOVATIVE PROPERTIES COMPANY (US) 2012-03-27 US claimed
US-20100331444-A1 COMPOSITION CONTAINING UNSATURATED SILICONE COMPOUNDS, DENTAL MATERIALS CONTAINING THEM AND USE THEREOF 3M ESPE AG (A WHOLLY-OWNED SUBSIDUARY OF 3M COMPANY) 2010-12-30 US claimed
US-7807730-B2 Composition containing unsaturated silicone compounds, dental materials containing them and use thereof 3M ESPE AG (DE) 2010-10-05 US claimed
EP-0983327-B1 LOW MIGRATORY PHOTOINITIATORS FOR OXYGEN-SCAVENGING COMPOSITIONS CRYOVAC INC (US) 2006-05-10 EP claimed
US-6464896-B1 INCORPORATION OF DERIVATIVES OF BENZOPHENONE INTO AN OXYGEN SCAVENGING RESIN CAUSES SHORT INITIATION PERIODS FOR SCAVENGING OXYGEN AND REDUCED MIGRATION OF THE INITIATOR FROM THE RESIN COMPOSITIONS; FOOD AND BEVERAGE PACKAGING CRYOVAC, INC. 2002-10-15 US claimed
US-6254802-B1 FOR USE IN FOOD PACKAGES CRYOVAC, INC. 2001-07-03 US claimed
EP-0983327-A1 LOW MIGRATORY PHOTOINITIATORS FOR OXYGEN-SCAVENGING COMPOSITIONS Cryovac, Inc. (US) 2000-03-08 EP claimed
WO-1998051759-A1 LOW MIGRATORY PHOTOINITIATORS FOR OXYGEN-SCAVENGING COMPOSITIONS CRYOVAC, INC. (US) 1998-11-19 WO claimed
US-12508787-B2 Methods and apparatus for producing contact lenses COOPERVISION INTERNATIONAL LIMITED (GB) 2025-12-30 US disclosed
EP-4646326-A1 METHODS AND APPARATUS FOR PRODUCING CONTACT LENSES CooperVision International Limited (GB) 2025-11-12 EP disclosed
WO-2024224078-A1 METHODS AND APPARATUS FOR PRODUCING CONTACT LENSES COOPERVISION INTERNATIONAL LIMITED (GB) 2024-10-31 WO disclosed
US-20240359415-A1 METHODS AND APPARATUS FOR PRODUCING CONTACT LENSES COOPERVISION INTERNATIONAL LIMITED (GB) 2024-10-31 US disclosed
US-11773207-B2 Thiol compound, method for synthesizing same, and uses for said thiol compound SHIKOKU CHEMICALS CORPORATION (JP) 2023-10-03 US disclosed
US-11773207-B2 Thiol compound, method for synthesizing same, and uses for said thiol compound SHIKOKU CHEMICALS CORPORATION (JP) 2023-10-03 US disclosed
WO-1998058295-A1 A PHOTORESIST DEVELOPABLE IN AQUEOUS BASE MADE FROM AN ACID FUNCTIONAL β-HYDROXY THIOL RESIN AND AN UNSATURATED RESIN MACDERMID ACUMEN, INC. (US) 1998-12-23 WO disclosed
WO-1997036741-A9 COMPOSITIONS AND METHODS FOR SELECTIVELY CROSS-LINKING FILMS AND IMPROVED FILM ARTICLES RESULTING THEREFROM 1998-12-17 WO disclosed
WO-1998051759-A1 LOW MIGRATORY PHOTOINITIATORS FOR OXYGEN-SCAVENGING COMPOSITIONS CRYOVAC, INC. (US) 1998-11-19 WO disclosed
WO-1997036741-A1 COMPOSITIONS AND METHODS FOR SELECTIVELY CROSS-LINKING FILMS AND IMPROVED FILM ARTICLES RESULTING THEREFROM CRYOVAC, INC. (US) 1997-10-09 WO disclosed
US-4467082-A Organopolysiloxane photosensitizers and methods for their preparation DOW CORNING CORPORATION (US) 1984-08-21 US disclosed
EP-0088842-A1 Organopolysiloxane photosensitizers and methods for their preparation Toray Silicone Company Limited (JP) 1983-09-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100331444-A1 COMPOSITION CONTAINING UNSATURATED SILICONE COMPOUNDS, DENTAL MATERIALS CONTAINING THEM AND USE THEREOF SMCHD1, CAD, ESD NPC1 3845/4885MAPT 3012/4885RAB9A 4243/4885
US-12508787-B2 Methods and apparatus for producing contact lenses SMCHD1, HSF1, CRYAA NPC1 4334/4885MAPT 308/4885RAB9A 2411/4885
US-11773207-B2 Thiol compound, method for synthesizing same, and uses for said thiol compound TST, TMT1A, CTH NPC1 3586/4885MAPT 1549/4885RAB9A 4459/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.