SCHEMBL8368449

SCHEMBL8368449

Cc1ccc(S(=O)(=O)On2ccccc2=O)cc1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.40
VDR P11473 2/20 0.38
KDM4E B2RXH2 5/20 0.34
MAPT P10636 5/20 0.34
ALDH1A1 P00352 4/20 0.34
F2 P00734 4/20 0.34
HTT P42858 3/20 0.34
XBP1 P17861 2/20 0.34
HSD17B2 P37059 2/20 0.33
MEN1 O00255 4/20 0.33
HPGD P15428 2/20 0.33
HSD11B1 P28845 1/20 0.33
HSD17B3 P37058 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C19 P33261 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
LMNA P02545 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ESR1 P03372 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8368446 0.80 VDR (0.58) KMT2AVDRKDM4EMAPTALDH1A1
SCHEMBL10787195 0.77 KMT2A (0.67) KMT2AVDRKDM4EMAPTALDH1A1
SCHEMBL8778040 0.76 PARL (0.53) KMT2AVDRKDM4EMAPTALDH1A1
SCHEMBL12051386 0.73 PARL (0.37) KMT2AVDRKDM4EMAPTALDH1A1
SCHEMBL9986033 0.73 KMT2A (0.43) KMT2AKDM4EMAPTALDH1A1MEN1
SCHEMBL27627188 0.71 ALDH1A1 (0.42) KMT2AMAPTALDH1A1HTTMEN1
SCHEMBL9986290 0.70 MMP2 (0.42) KMT2AMAPTALDH1A1HTTMEN1
SCHEMBL8370936 0.69 POLB (0.33) KMT2AVDRKDM4EMAPTALDH1A1
SCHEMBL8837665 0.69 MEN1 (0.53) KMT2AHTTHSD17B2MEN1HSD11B1
SCHEMBL12032450 0.67 MCOLN3 (0.46) KMT2AKDM4EMAPTALDH1A1F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0510440-B1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith CLARIANT GMBH (DE) 1999-01-13 EP disclosed
EP-0510443-B1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AG (DE) 1995-03-22 EP disclosed
EP-0510442-A1 Substituted 1-sulfonyloxy-2-pyridones, process for their preparation and their use HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
EP-0510443-A1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed
EP-0510440-A1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed