SCHEMBL83884

SCHEMBL83884

C=C(Cc1ccc(O)cc1)C(=O)O

nearest known ligand 0.63

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.61
CAMK2A Q9UQM7 1/20 0.61
FNTA P49354 1/20 0.55
FNTB P49356 1/20 0.55
CTBP2 P56545 1/20 0.55
ESR1 P03372 3/20 0.48
ESR2 Q92731 3/20 0.48
SHBG P04278 1/20 0.48
NPC1 O15118 2/20 0.44
RAB9A P51151 2/20 0.44
SLC7A5 Q01650 1/20 0.42
CPT1B Q92523 1/20 0.41
LMNA P02545 1/20 0.41
BLM P54132 1/20 0.40
ME2 P23368 1/20 0.40
ME1 P48163 1/20 0.40
ME3 Q16798 1/20 0.40
SENP1 Q9P0U3 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3426193 0.91 CA2 (0.46) CA2CAMK2AFNTAFNTBCTBP2
SCHEMBL5420954 0.88 FNTA (0.49) CA2CAMK2AFNTAFNTBCTBP2
SCHEMBL2732935 0.84 LMNA (0.54) CA2CAMK2ALMNA
Anolignan B SCHEMBL23268876 0.84 CA2 (0.54) CA2CAMK2AFNTAFNTBCTBP2
SCHEMBL13176927 0.82 CA2 (0.54) CA2CAMK2AFNTAFNTBCTBP2
SCHEMBL41907 0.82 CES1 (0.58) FNTAFNTBCTBP2LMNA
SCHEMBL397389 0.81 MEN1 (0.49) NPC1RAB9ALMNA
SCHEMBL6442701 0.81 ALDH1A1 (0.52) CA2CAMK2ACTBP2LMNA
SCHEMBL13461368 0.81 CA2 (0.54) CA2CAMK2AFNTAFNTBCTBP2
SCHEMBL6473235 0.81 TPMT (0.41) CA2CAMK2ACTBP2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1086160-B1 CARBOXY-FUNCTIONALIZED POLYPHENYLENE ETHERS AND BLENDS CONTAINING THEM GEN ELECTRIC (US) 2006-10-04 EP claimed
US-20030143490-A1 Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof FUJITSU LIMITED (JP) 2003-07-31 US claimed
US-20010034418-A1 Carboxy-functionalized polyphenylene ethers and blends containing them YEAGER GARY WILLIAM (US) 2001-10-25 US claimed
US-20010034430-A1 Carboxy-functionalized polyphenylene ethers and blends containing them SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2001-10-25 US claimed
US-6268463-B1 POLYPHENYLENE ETHERS WITH CARBOXY GROUPS GENERAL ELECTRIC COMPANY 2001-07-31 US claimed
EP-1086160-A1 CARBOXY-FUNCTIONALIZED POLYPHENYLENE ETHERS AND BLENDS CONTAINING THEM GENERAL ELECTRIC COMPANY (US) 2001-03-28 EP claimed
WO-1999064494-A1 CARBOXY-FUNCTIONALIZED POLYPHENYLENE ETHERS AND BLENDS CONTAINING THEM GENERAL ELECTRIC COMPANY (US) 1999-12-16 WO claimed
EP-3950753-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, INDUCTOR AND ANTENNA FUJIFILM CORP (JP) 2026-03-25 EP disclosed
US-12391783-B2 Polymer compound, and resin composition containing said compound NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2025-08-19 US disclosed
CN-120019085-A Method for producing polymer 丸善石油化学株式会社 2025-05-16 CN disclosed
WO-2025100122-A1 ELECTRODE PERIPHERAL EMBEDDING MATERIAL, PRE-BAKED FILM OF ELECTRODE PERIPHERAL EMBEDDING MATERIAL, METHOD FOR PRODUCING PRE-BAKED FILM OF ELECTRODE PERIPHERAL EMBEDDING MATERIAL, AND MICRO-LED DISPLAY ELEMENT 日産化学株式会社 2025-05-15 WO disclosed
US-12278032-B2 Photosensitive resin composition, cured film, inductor and antenna FUJIFILM CORPORATION (JP) 2025-04-15 US disclosed
WO-2025027810-A1 ELECTRODE PERIPHERAL EMBEDDED MATERIAL, ELECTRODE PERIPHERAL EMBEDDED MATERIAL PREBAKED FILM, METHOD FOR MANUFACTURING ELECTRODE PERIPHERAL EMBEDDED MATERIAL PREBAKED FILM, AND MICRO LED DISPLAY ELEMENT 日産化学株式会社 2025-02-06 WO disclosed
EP-0435633-A2 Electrically conductive layer for electrical devices XEROX CORPORATION (US) 1991-07-03 EP disclosed
EP-0435635-A2 Electrically conductive layer for electrical devices XEROX CORPORATION (US) 1991-07-03 EP disclosed
EP-0435634-A2 Conductive and blocking layers for electrophotographic imaging members XEROX CORPORATION (US) 1991-07-03 EP disclosed
US-4988597-A MULTILAYER ELECTROGRAPHY IMAGING PROCESS AND ELEMENT, A PHOTOCONDUCTIVE LAYER, AN ELECTROCONDUCTIVE LAYER OF A PARTIALLY CRO SSLINKED POLYMER OF ACRYLAMIDOGLYCOLATE ALKYL ETHER XEROX CORPORATION (US) 1991-01-29 US disclosed
EP-0399755-A1 Light-sensitive composition and presensitized plate for use in making lithographic printing plates Fuji Photo Film Co., Ltd. (JP) 1990-11-28 EP disclosed
EP-0373510-A2 Process for preparing a light-sensitive lithographic printing plate KONICA CORPORATION (JP) 1990-06-20 EP disclosed
US-4542085-A INCREASING ABSORPTION OVER SPECIFIC WAVELENGTH REGION WITH INCREASING EXPOSURE FUJI PHOTO FILM CO., LTD. (JP) 1985-09-17 US disclosed