SCHEMBL8430733

SCHEMBL8430733

Oc1ccc(O)c(Cc2ccc(Cc3cc(O)ccc3O)cc2)c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KEAP1 Q14145 1/20 0.59
MAPT P10636 4/20 0.57
MEN1 O00255 3/20 0.57
KMT2A Q03164 3/20 0.57
ALOX5 P09917 2/20 0.55
ESR1 P03372 1/20 0.52
ESR2 Q92731 1/20 0.52
CYP3A4 P08684 3/20 0.52
HPGD P15428 3/20 0.52
ALOX15 P16050 3/20 0.52
HIF1A Q16665 3/20 0.52
HSD17B10 Q99714 2/20 0.52
EGFR P00533 2/20 0.49
LCK P06239 1/20 0.49
LMNA P02545 2/20 0.46
ALOX12 P18054 2/20 0.46
HTT P42858 2/20 0.46
BCL2 P10415 1/20 0.46
BCL2L1 Q07817 1/20 0.46
SLC22A1 O15245 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9188763 0.90 AMY1A (0.52) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL390179 0.89 ALOX5 (0.71) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL50932 0.87 MAPT (0.58) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL31244463 0.87 MAPT (0.58) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL2512176 0.87 KEAP1 (0.47) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL8349574 0.86 ESR1 (0.61) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL10005890 0.86 ESR1 (0.61) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL16592194 0.86 ESR1 (0.61) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL14283807 0.85 KEAP1 (0.46) KEAP1MAPTMEN1KMT2AALOX5
SCHEMBL11097682 0.85 CALM1 (0.51) KEAP1MEN1KMT2AESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5945516-A PRIOR TO ESTERIFICATION OF THE POLYHYDROXY PHENOL WITH THE NAPHTHOQUINONE DIAZIDE SULFONYL HALIDE, THE REACTANTS ARE INITIALLY DISSOLVED IN AN APROTIC SOLVENT TOGETHER WITH STRONG BASE; NONPRECIPITATING, FOR FORMATION OF PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1999-08-31 US disclosed
US-5821345-A DISSOLVING WITH A STRONG BASE AND APROTIC SOLVENT; ESTER INTERCHANGE SHIPLEY COMPANY, L.L.C. (US) 1998-10-13 US disclosed