SCHEMBL8528959

SCHEMBL8528959

O=S(=O)([O-])C(F)C(F)(F)C(F)(F)F.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.31

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.31
PTPN1 P18031 1/20 0.31
GPR3 P46089 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA5A P35218 1/20 0.31
CA9 Q16790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29721568 0.80 HTR6 (0.32) PTPN1CA1CA2CA5ACA9
Sulfuric Acid SCHEMBL1458006 0.79 MEN1 (0.33) HSD11B1PTPN1GPR3CA1CA2
SCHEMBL1087889 0.77 GPR3 (0.34) PTPN1GPR3CA1CA2CA5A
Sulfuric Acid SCHEMBL1458005 0.76 HSD11B1 (0.32) HSD11B1
Trifluoromethanesulfonic Acid SCHEMBL37032 0.76 GPR3 (0.50) HSD11B1PTPN1GPR3CA1CA2
Trifluoromethanesulfonic Acid SCHEMBL31155703 0.76 GPR3 (0.50) HSD11B1PTPN1GPR3CA1CA2
SCHEMBL5872604 0.76 GPR3 (0.36) PTPN1GPR3CA1CA2CA5A
Potassium Ion SCHEMBL4774024 0.75
SCHEMBL546819 0.75 GPR3 (0.42) HSD11B1PTPN1GPR3CA1CA2
Trifluoromethanesulfonic Acid SCHEMBL6118365 0.74 GPR3 (0.48) HSD11B1PTPN1GPR3CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0710885-B1 Radiation sensitive composition CLARIANT FINANCE BVI LTD (VG) 1998-12-30 EP disclosed
US-5738972-A BLEND OF BINDER, DISSOLUTION INHIBITOR, PHOTOSENSITIVR COMPOUND, BASE, PHENOLIC RESIN AND SOLVENT HOECHST JAPAN LIMITED (JP) 1998-04-14 US disclosed
EP-0756203-A1 Radiation-sensitive composition HOECHST INDUSTRY LIMITED (JP) 1997-01-29 EP disclosed
EP-0710885-A1 Radiation sensitive composition HOECHST JAPAN LIMITED (JP) 1996-05-08 EP disclosed