Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
| ▸ | CA5A | P35218 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1088603 | 0.91 | KCNH2 (0.32) | PTPN1CA1CA2 | |
| SCHEMBL1088638 | 0.91 | GPR3 (0.35) | GPR3PTPN1CA1CA2CA5A | |
| SCHEMBL1089266 | 0.91 | KCNH2 (0.32) | PTPN1CA1CA2 | |
| SCHEMBL1088827 | 0.91 | GPR3 (0.35) | GPR3PTPN1CA1CA2CA5A | |
| SCHEMBL1089234 | 0.89 | HSD11B1 (0.38) | — | |
| SCHEMBL1088434 | 0.88 | GAA (0.37) | — | |
| SCHEMBL29745863 | 0.86 | GPR3 (0.40) | GPR3PTPN1CA1CA2CA5A | |
| SCHEMBL1088451 | 0.84 | ALDH1A1 (0.33) | CA1CA2CA5ACA9 | |
| SCHEMBL1088656 | 0.84 | AGER (0.36) | GPR3CA1CA2CA5ACA9 | |
| SCHEMBL1088937 | 0.84 | NR3C1 (0.34) | GPR3PTPN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| US-20070105043-A1 | Photosensitive coating for enhancing a contrast of a photolithographic exposure | QIMONDA AG (DE) | 2007-05-10 | — | — | US | claimed |
| US-6821706-B2 | SOLVES OR AT LEAST REDUCES THE CHARGING PROBLEM AND AT THE SAME TIME HAS HIGH EXPOSURE SENSITIVITY | INFINEON TECHNOLOGIES AG (DE) | 2004-11-23 | — | — | US | claimed |
| US-20040081910-A1 | Polymerizable composition, polymer, resist, and process for electron beam lithography | POLARIS INNOVATIONS LIMITED (IE) | 2004-04-29 | — | — | US | claimed |
| CN-1475861-A | Polymerizable composition, inhibitor and electron beam plate printing method | �����ɷ� | 2004-02-18 | — | — | CN | claimed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | claimed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | claimed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | claimed |
| US-12338309-B2 | Dielectric film-forming composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-24 | — | — | US | disclosed |
| US-20240254268-A1 | Dielectric Film-Forming Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | disclosed |
| US-11945894-B2 | Dielectric film-forming composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-04-02 | — | — | US | disclosed |
| EP-4176001-A1 | DIELECTRIC FILM-FORMING COMPOSITION | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2023-05-10 | — | — | EP | disclosed |
| CN-115734982-A | Dielectric film-forming composition | 富士胶片电子材料美国有限公司 | 2023-03-03 | — | — | CN | disclosed |
| EP-4118679-A1 | METAL DEPOSITION PROCESSES | Fujifilm Electronic Materials U.S.A., Inc. (US) | 2023-01-18 | — | — | EP | disclosed |
| EP-0710885-B1 | Radiation sensitive composition | CLARIANT FINANCE BVI LTD (VG) | 1998-12-30 | — | — | EP | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| US-5738972-A | BLEND OF BINDER, DISSOLUTION INHIBITOR, PHOTOSENSITIVR COMPOUND, BASE, PHENOLIC RESIN AND SOLVENT | HOECHST JAPAN LIMITED (JP) | 1998-04-14 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| EP-0756203-A1 | Radiation-sensitive composition | HOECHST INDUSTRY LIMITED (JP) | 1997-01-29 | — | — | EP | disclosed |
| EP-0710885-A1 | Radiation sensitive composition | HOECHST JAPAN LIMITED (JP) | 1996-05-08 | — | — | EP | disclosed |