SCHEMBL8550840

SCHEMBL8550840

C=C(CCCNC(=O)Nc1ccc(C)cc1)C(=O)O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.60
CYP1A2 P05177 1/20 0.60
CYP3A4 P08684 1/20 0.60
CYP2C9 P11712 1/20 0.60
CYP2C19 P33261 1/20 0.60
CASR P41180 1/20 0.53
SLC6A3 Q01959 1/20 0.53
NPC1 O15118 3/20 0.51
SMN1; SMN2 Q16637 2/20 0.51
CNR1 P21554 1/20 0.50
PDGFRB P09619 1/20 0.48
KDR P35968 1/20 0.48
LMNA P02545 1/20 0.48
EPHX1 P07099 5/20 0.48
RAB9A P51151 2/20 0.48
HTT P42858 1/20 0.48
MEN1 O00255 1/20 0.48
TP53 P04637 1/20 0.48
HPGD P15428 1/20 0.48
KMT2A Q03164 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8550324 0.91 ALDH1A1 (0.56) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL4942260 0.87 MAOA (0.47) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL8549833 0.87 EPHX1 (0.60) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL8550250 0.86 EPHX2 (0.50) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL7097155 0.83 LMNA (0.51) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL7096720 0.83 ALDH1A1 (0.50) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL8549863 0.82 GHSR (0.49) ALDH1A1LMNAEPHX1HTTKMT2A
SCHEMBL9007574 0.82 EPHX1 (0.62) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19
SCHEMBL15914264 0.82 CNR1 (0.53) ALDH1A1CNR1LMNAEPHX1RAB9A
SCHEMBL8549984 0.82 EPHX1 (0.43) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed