Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13008684 | 0.84 | KMT2A (0.30) | — | |
| SCHEMBL13759960 | 0.83 | — | — | |
| SCHEMBL14313768 | 0.83 | — | — | |
| SCHEMBL13718849 | 0.83 | ALDH1A1 (0.31) | ALDH1A1TSHR | |
| SCHEMBL15278108 | 0.82 | — | — | |
| SCHEMBL953223 | 0.81 | ALDH1A1 (0.30) | ALDH1A1TSHR | |
| SCHEMBL15278109 | 0.81 | L3MBTL1 (0.33) | — | |
| SCHEMBL218470 | 0.81 | ALDH1A1 (0.41) | ALDH1A1TSHR | |
| SCHEMBL13809878 | 0.80 | — | — | |
| SCHEMBL14982828 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9023580-B2 | Method of forming polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| EP-2433972-B1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO LTD (JP) | 2014-11-12 | — | — | EP | disclosed |
| EP-1717261-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2014-01-01 | — | — | EP | disclosed |
| US-20130137049-A1 | METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| EP-2433972-A1 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-03-28 | — | — | EP | disclosed |
| US-7723007-B2 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-25 | — | — | US | disclosed |
| US-7723007-B2 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-25 | — | — | US | disclosed |
| US-7723007-B2 | Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-25 | — | — | US | disclosed |
| US-7608381-B2 | copolymer of an acrylate monomer containing a 20 membered cyclic group, an acrylate monomer of alpha-alkyl acrylate estre having a lactone containing monocyclic or polycyclic group, a lower alkylate ester having an aliphatic cyclic group containing non acid dissociable dissociation inhibiting group | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-27 | — | — | US | disclosed |
| US-7608381-B2 | copolymer of an acrylate monomer containing a 20 membered cyclic group, an acrylate monomer of alpha-alkyl acrylate estre having a lactone containing monocyclic or polycyclic group, a lower alkylate ester having an aliphatic cyclic group containing non acid dissociable dissociation inhibiting group | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-27 | — | — | US | disclosed |
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | OGATA TOSHIYUKI | 2008-07-10 | — | — | US | disclosed |
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | OGATA TOSHIYUKI | 2008-07-10 | — | — | US | disclosed |
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | OGATA TOSHIYUKI | 2008-07-10 | — | — | US | disclosed |
| US-20080096126-A1 | Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| US-20080096126-A1 | Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| EP-1717261-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080166655-A1 | Polymer Compound, Photoresist Composition Including the Polymer Compound, and Resist Pattern Formation Method | CRHR1, ADH1C, ADH1A | ALDH1A1 253/4885TSHR 1579/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.