Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | FDFT1 | P37268 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 5/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23332998 | 0.86 | HSD11B1 (0.34) | FDFT1HSD11B1EPHX1CYP2C9SCN9A | |
| SCHEMBL14962547 | 0.85 | THRB (0.46) | ALDH1A1TSHRTHRBFDFT1HSD11B1 | |
| SCHEMBL2739903 | 0.82 | HSD11B1 (0.36) | ALDH1A1FDFT1HSD11B1EPHX1SCN9A | |
| SCHEMBL13445836 | 0.81 | ALDH1A1 (0.42) | ALDH1A1TSHRTHRBEPHX1 | |
| SCHEMBL855811 | 0.81 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL12190125 | 0.81 | HSD11B1 (0.34) | HSD11B1 | |
| SCHEMBL13963899 | 0.79 | NPSR1 (0.38) | ALDH1A1TSHR | |
| SCHEMBL13963895 | 0.79 | PRKCA (0.38) | ALDH1A1HSD11B1 | |
| SCHEMBL14982817 | 0.79 | — | — | |
| SCHEMBL14616361 | 0.78 | MAPK1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250293030-A1 | SOLUBILITY SWITCH TOPOGRAPHIC FILL MATERIALS AND METHODS | BREWER SCIENCE, INC. | 2025-09-18 | — | — | US | claimed |
| US-20250293030-A1 | SOLUBILITY SWITCH TOPOGRAPHIC FILL MATERIALS AND METHODS | BREWER SCIENCE, INC. | 2025-09-18 | — | — | US | disclosed |
| US-20240158662-A1 | TWO-COMPONENT CURABLE COATING AGENT AND MULTILAYER FILM | HARIMA CHEMICALS, INC. (JP) | 2024-05-16 | — | — | US | disclosed |
| US-20240150607-A1 | TWO-COMPONENT CURABLE COATING AGENT AND MULTILAYER FILM | HARIMA CHEMICALS, INC. (JP) | 2024-05-09 | — | — | US | disclosed |
| CN-117083354-A | Two-component curable coating agent and multilayer film | 哈利玛化成株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-117062882-A | Two-component curable coating agent and multilayer film | 哈利玛化成株式会社 | 2023-11-14 | — | — | CN | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| WO-2022191143-A1 | TWO-PACK TYPE CURABLE COATING AGENT AND MULTILAYER FILM | ハリマ化成株式会社 | 2022-09-15 | — | — | WO | disclosed |
| WO-2022191144-A1 | TWO-PACK TYPE CURABLE COATING AGENT AND MULTILAYER FILM | ハリマ化成株式会社 | 2022-09-15 | — | — | WO | disclosed |
| US-20210397098-A1 | CHEMICAL LIQUID, RINSING SOLUTION, AND RESIST PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2021-12-23 | — | — | US | disclosed |
| EP-1882981-A1 | POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-01-30 | — | — | EP | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070207408-A1 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-09-06 | — | — | US | disclosed |
| US-20070148594-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-06-28 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| EP-1717261-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-11-02 | — | — | EP | disclosed |
| US-20050227174-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2005-10-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | ADH1A, ADH1C, POLR1A | ALDH1A1 56/4885TSHR 4198/4885THRB 4287/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.