SCHEMBL859331

SCHEMBL859331

CC(CC(c1ccc(O)cc1)c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 6/20 0.57
ESR2 Q92731 5/20 0.57
PDCD1 Q15116 1/20 0.52
CD274 Q9NZQ7 1/20 0.52
MIF P14174 1/20 0.48
TRPA1 O75762 4/20 0.47
CYP2C9 P11712 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
LMNA P02545 1/20 0.46
CYP1A2 P05177 1/20 0.46
PGR P06401 1/20 0.46
CHRM2 P08172 1/20 0.46
CYP3A4 P08684 1/20 0.46
ADORA3 P0DMS8 1/20 0.46
AR P10275 1/20 0.46
CYP2D6 P10635 1/20 0.46
MAPT P10636 1/20 0.46
CHRM1 P11229 1/20 0.46
ALOX15 P16050 1/20 0.46
DRD1 P21728 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8579168 0.94 TRPA1 (0.56) ESR1ESR2PDCD1CD274MIF
SCHEMBL11350485 0.94 TRPA1 (0.56) ESR1ESR2PDCD1CD274MIF
SCHEMBL6341136 0.88 ESR1 (0.64) ESR1ESR2PDCD1CD274MIF
SCHEMBL19420426 0.84 TRPA1 (0.60) ESR1ESR2PDCD1CD274MIF
SCHEMBL414496 0.84 ESR1 (0.59) ESR1ESR2PDCD1CD274MIF
SCHEMBL278571 0.84 ESR1 (0.54) ESR1ESR2PDCD1CD274MIF
SCHEMBL9329668 0.84 ESR1 (0.54) ESR1ESR2PDCD1CD274MIF
SCHEMBL1596715 0.83 ESR1 (0.50) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL109016 0.82 ESR1 (0.52) ESR1ESR2PDCD1CD274CYP2C9
SCHEMBL16803087 0.82 ESR1 (0.57) ESR1ESR2PDCD1CD274MIF

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 409 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-61065876-A None JP disclosed
JP-63183918-A None JP disclosed
JP-61078821-A None JP disclosed
US-12624265-B2 Antistatic agent, antistatic composition comprising same, antistatic resin composition comprising same, and molded article thereof ADEKA CORPORATION (JP) 2026-05-12 US disclosed
EP-4306566-B1 CURABLE RESIN COMPOSITION, CURED PRODUCT AND ADHESIVE ADEKA CORP (JP) 2026-05-06 EP disclosed
US-12590178-B2 Curable resin composition and method for suppressing curing shrinkage of curable resin composition ADEKA CORPORATION (JP) 2026-03-31 US disclosed
US-12584036-B2 Ink ejection device Konica Minolta, Inc. (JP) 2026-03-24 US disclosed
US-20260022204-A1 ANTISTATIC AGENT, ANTISTATIC AGENT COMPOSITION CONTAINING SAME, ANTISTATIC RESIN COMPOSITION CONTAINING SAID ANTISTATIC AGENT OR SAID ANTISTATIC AGENT COMPOSITION, AND MOLDED BODY AND FILM THEREOF ADEKA CORPORATION (JP) 2026-01-22 US disclosed
US-12473472-B2 Photocurable adhesive DENSO CORPORATION (JP) 2025-11-18 US disclosed
US-12473470-B2 Photocurable adhesive DENSO CORPORATION (JP) 2025-11-18 US disclosed
EP-0709736-A1 Positive chemically amplified resist composition and method for producing compounds used therein FUJI PHOTO FILM CO., LTD. (JP) 1996-05-01 EP disclosed
EP-0706089-A2 Process for synthesizing quinonediazide ester and positive working photoresist containing the same FUJI PHOTO FILM CO., LTD. (JP) 1996-04-10 EP disclosed
US-5494773-A MIXTURE WITH A 1,2-QUINONEDIAZIDE COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1996-02-27 US disclosed
EP-0684521-A1 Positive working photosensitive compositions FUJI PHOTO FILM CO., LTD. (JP) 1995-11-29 EP disclosed
EP-0677789-A1 Positive photoresist composition Fuji Photo Film Co., Ltd. (JP) 1995-10-18 EP disclosed
EP-0672952-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-09-20 EP disclosed
EP-0658807-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-06-21 EP disclosed
JP-S63183918-A EPOXY RESIN COMPOSITION UBE IND LTD 1988-07-29 JP disclosed
JP-S6178821-A EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR SEALING YUKA SHELL EPOXY KK 1986-04-22 JP disclosed
JP-S6165876-A TRIFUNCTIONAL EPOXY COMPOUND YUKA SHELL EPOXY KK 1986-04-04 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12624265-B2 Antistatic agent, antistatic composition comprising same, antistatic resin composition comprising same, and molded article thereof SORD, SUCLA2, SUCLG1 ESR1 1012/4885ESR2 785/4885PDCD1 2744/4885
US-20260022204-A1 ANTISTATIC AGENT, ANTISTATIC AGENT COMPOSITION CONTAINING SAME, ANTISTATIC RESIN COMPOSITION CONTAINING SAID ANTISTATIC AGENT OR SAID ANTISTATIC AGENT COMPOSITION, AND MOLDED BODY AND FILM THEREOF PHOSPHO1, EBP, CA1 ESR1 758/4885ESR2 337/4885PDCD1 3360/4885
US-12590178-B2 Curable resin composition and method for suppressing curing shrinkage of curable resin composition SEM1, RER1, JMJD6 ESR1 1350/4885ESR2 598/4885PDCD1 4759/4885
US-12584036-B2 Ink ejection device ILK, ITGA4, ITGB3 ESR1 114/4885ESR2 456/4885PDCD1 4159/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.