SCHEMBL863926

SCHEMBL863926

CC(=O)c1ccc(C(C)(C)C(Cl)(Cl)Cl)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.45
NR1H4 Q96RI1 1/20 0.45
MAPT P10636 5/20 0.43
HPGD P15428 3/20 0.43
KMT2A Q03164 3/20 0.43
RAB9A P51151 3/20 0.43
LMNA P02545 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
MEN1 O00255 2/20 0.42
ALDH1A1 P00352 2/20 0.42
SMN1; SMN2 Q16637 3/20 0.42
HSD17B1 P14061 1/20 0.42
MAPK1 P28482 2/20 0.39
HDAC1 Q13547 1/20 0.39
NOS3 P29474 1/20 0.39
NOS1 P29475 1/20 0.39
MAOB P27338 1/20 0.39
KIF11 P52732 1/20 0.39
NPC1 O15118 2/20 0.39
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL678316 0.83 KMT2A (0.52) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL20494379 0.79 MAOB (0.46) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL8349213 0.78 EPHX2 (0.47) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL9472225 0.78 HPGD (0.50) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL11278492 0.78 MAPT (0.51) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL677816 0.78 MAPT (0.50) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL397829 0.78 EPHX2 (0.65) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL548546 0.76 EPHX2 (0.49) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL13211688 0.75 MAPT (0.52) EPHX2NR1H4MAPTHPGDKMT2A
SCHEMBL2332100 0.74 EPHX2 (0.47) EPHX2NR1H4MAPTHPGDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 354 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260132301-A1 Ink Composition, Electronic Apparatus and Manufacturing Method of the Same SAMSUNG DISPLAY CO., LTD. (KR) 2026-05-14 US disclosed
US-20260133489-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG SDI CO LTD (KR) 2026-05-14 US disclosed
US-20260125596-A1 CURABLE COMPOSITION, CURED LAYER USING THE COMPOSITION AND DISPLAY DEVICE INCLUDING THE CURED LAYER SAMSUNG SDI CO LTD (KR) 2026-05-07 US disclosed
US-20260126564-A1 CORE-SHELL COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME, PHOTOSENSITIVE RESIN LAYER, COLOR FILTER AND CMOS IMAGE SENSOR SAMSUNG SDI CO LTD (KR) 2026-05-07 US disclosed
US-20260118551-A1 CORE-SHELL COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME, PHOTOSENSITIVE RESIN LAYER, COLOR FILTER, AND CMOS IMAGE SENSOR SMSUNG SDI CO LTD (KR) 2026-04-30 US disclosed
US-20260123184-A1 PIXEL DEFINE LAYER DUK SAN NEOLUX CO., LTD. (KR) 2026-04-30 US disclosed
US-20260123185-A1 PIXEL DEFINE LAYER DUK SAN NEOLUX CO., LTD. (KR) 2026-04-30 US disclosed
US-12593571-B2 Method for preparing pixel define layer DUK SAN NEOLUX CO., LTD. (KR) 2026-03-31 US disclosed
US-12583874-B2 Compound, anti-reflection film comprising same, and display device SAMSUNG SDI CO., LTD. (KR) 2026-03-24 US disclosed
US-12578642-B2 Photosensitive resin composition, and photosensitive resin film and colour filter manufactured by using same SAMSUNG SDI CO., LTD. (KR) 2026-03-17 US disclosed
US-7393130-B2 Optical substrate, manufacturing method thereof, planar lighting device and electrooptical device SEIKO EPSON CORPORATION (JP) 2008-07-01 US disclosed
US-20070002205-A1 OPTICAL SUBSTRATE, MANUFACTURING METHOD THEREOF, PLANAR LIGHTING DEVICE AND ELECTROOPTICAL DEVICE SEIKO EPSON CORPORATION (JP) 2007-01-04 US disclosed
US-20060035065-A1 Sheet for forming process and method for manufacturing the same, image forming method, method for manufacturing forming processed product and the forming processed product FUJI XEROX CO., LTD. (JP) 2006-02-16 US disclosed
US-5558975-A PHOTOPOLYMERIZATION CANON KABUSHIKI KAISHA (JP) 1996-09-24 US disclosed
EP-0447588-B1 Liquid jet recording head and recording apparatus having same CANON KK (JP) 1994-08-31 EP disclosed
EP-0307920-B1 Resin composition curable with an active energy ray containing graft copolymerized polymer with trunk chain containing dicyclopentenyl group CANON KK (JP) 1994-01-26 EP disclosed
US-5068263-A A resin curable with ultraviolet radiation or electron beams capable of forming patterns on copper coated laminates for use as a printed board CANON KABUSHIKI KAISHA (JP) 1991-11-26 US disclosed
EP-0447588-A1 Liquid jet recording head and recording apparatus having same CANON KABUSHIKI KAISHA (JP) 1991-09-25 EP disclosed
EP-0307920-A2 Resin composition curable with an active energy ray containing graft copolymerized polymer with trunk chain containing dicyclopentenyl group CANON KABUSHIKI KAISHA (JP) 1989-03-22 EP disclosed
EP-0235704-A2 Carboxyl-terminated lactone acrylates UNION CARBIDE CORPORATION (US) 1987-09-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (10 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260123185-A1 PIXEL DEFINE LAYER EED, PLOD3, VCL EPHX2 3759/4885NR1H4 4636/4885MAPT 312/4885
US-12593571-B2 Method for preparing pixel define layer MEF2D, ITGB1, GRIN2D EPHX2 934/4885NR1H4 3893/4885MAPT 3344/4885
US-20260132301-A1 Ink Composition, Electronic Apparatus and Manufacturing Method of the Same EED, MMAB, MARK1 EPHX2 2539/4885NR1H4 4880/4885MAPT 865/4885
US-20260126564-A1 CORE-SHELL COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME, PHOTOSENSITIVE RESIN LAYER, COLOR FILTER AND CMOS IMAGE SENSOR TAS1R1, TAS1R2, ARCN1 EPHX2 427/4885NR1H4 4106/4885MAPT 1621/4885
US-12578642-B2 Photosensitive resin composition, and photosensitive resin film and colour filter manufactured by using same F10, RPP30, C9 EPHX2 1571/4885NR1H4 4269/4885MAPT 617/4885
US-20260123184-A1 PIXEL DEFINE LAYER EED, PLOD3, VCL EPHX2 2867/4885NR1H4 4803/4885MAPT 514/4885
US-20260118551-A1 CORE-SHELL COMPOUND, PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME, PHOTOSENSITIVE RESIN LAYER, COLOR FILTER, AND CMOS IMAGE SENSOR RCOR1, TAS1R2, TAS1R1 EPHX2 837/4885NR1H4 3034/4885MAPT 1784/4885
US-20260133489-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME ASH2L, RER1, ARCN1 EPHX2 292/4885NR1H4 3603/4885MAPT 2002/4885
US-20260125596-A1 CURABLE COMPOSITION, CURED LAYER USING THE COMPOSITION AND DISPLAY DEVICE INCLUDING THE CURED LAYER C5, CORO1C, CCT4 EPHX2 325/4885NR1H4 3636/4885MAPT 2460/4885
US-12583874-B2 Compound, anti-reflection film comprising same, and display device KISS1R, CCKAR, TACR2 EPHX2 590/4885NR1H4 175/4885MAPT 4428/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.