Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ZDHHC20 | Q5W0Z9 | 2/20 | 0.37 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.37 |
| ▸ | THRA | P10827 | 2/20 | 0.34 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9004580 | 0.89 | ZDHHC20 (0.38) | ZDHHC20ZDHHC2THRATHRBALDH1A1 | |
| SCHEMBL3478503 | 0.87 | ALDH1A1 (0.41) | ZDHHC20ZDHHC2THRATHRBALDH1A1 | |
| SCHEMBL17350247 | 0.83 | ZDHHC20 (0.33) | ZDHHC20ZDHHC2THRATHRB | |
| SCHEMBL28006375 | 0.82 | ZDHHC20 (0.35) | ZDHHC20ZDHHC2ALDH1A1TSHR | |
| SCHEMBL9004536 | 0.79 | THRA (0.33) | THRATHRBALDH1A1TSHR | |
| SCHEMBL8764529 | 0.76 | GABRA1 (0.34) | ZDHHC20ZDHHC2 | |
| SCHEMBL2791016 | 0.76 | THRA (0.32) | THRATHRBALDH1A1TSHR | |
| SCHEMBL15798065 | 0.76 | ZDHHC20 (0.32) | ZDHHC20ZDHHC2 | |
| SCHEMBL25468552 | 0.74 | TSHR (0.33) | THRATHRBALDH1A1TSHR | |
| SCHEMBL21891708 | 0.73 | ZDHHC20 (0.40) | ZDHHC20ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070099816-A1 | Hard Surface Cleaning Composition | THE CLOROX COMPANY | 2007-05-03 | — | — | US | claimed |
| US-12365815-B2 | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | RESONAC CORPORATION (JP) | 2025-07-22 | — | — | US | disclosed |
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3159915-B1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | FUJIMI INC (JP) | 2023-12-06 | — | — | EP | disclosed |
| US-20230295466-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, AND DEFECT SUPPRESSION METHOD | RESONAC CORPORATION (JP) | 2023-09-21 | — | — | US | disclosed |
| EP-2622016-B1 | ENERGY RECOVERY VENTILATION SULFONATED BLOCK COPOLYMER LAMINATE MEMBRANE | KRATON POLYMERS US LLC (US) | 2023-06-07 | — | — | EP | disclosed |
| EP-3133638-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2021-10-27 | — | — | EP | disclosed |
| US-11021559-B2 | Sulfonated block copolymer laminates with polar or active metal substrates | KRATON POLYMERS LLC (US) | 2021-06-01 | — | — | US | disclosed |
| US-20210010759-A1 | ENHANCED-EFFICIENCY ENERGY RECOVERY VENTILATION CORE | KRATON POLYMERS LLC (US) | 2021-01-14 | — | — | US | disclosed |
| EP-2957613-B1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INC (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-6878789-B2 | Preparation process of acrylic acid ester polymer | KURARAY CO., LTD. (JP) | 2005-04-12 | — | — | US | disclosed |
| US-20040234893-A9 | Resin composition and thermo/photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-11-25 | — | — | US | disclosed |
| EP-0945470-B1 | Preparation process of acrylic acid ester polymer | KURARAY CO (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040131972-A1 | Resin composition and thermo/photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2004-07-08 | — | — | US | disclosed |
| US-20040062939-A1 | Polymerizable composition and planogaphic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. | 2004-04-01 | — | — | US | disclosed |
| EP-1400851-A2 | Polymerizable composition and planographic printing plate precursor using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2004-03-24 | — | — | EP | disclosed |
| EP-1285751-A2 | Image recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2003-02-26 | — | — | EP | disclosed |
| US-20020032290-A1 | Preparation process of acrylic acid ester polymer | KURARAY CO., LTD. (JP) | 2002-03-14 | — | — | US | disclosed |
| US-6329480-B1 | POLYMERIZING ACRYLIC ACID ESTER, ACRYLIC/METHACRYLIC MONOMER PRESENCE OF AN ORGANOLITHIUM COMPOUND AND AN ORGANOALUMINUM COMPOUND TO FORM BLOCK COPOLYMER | KURARAY CO., LTD. (JP) | 2001-12-11 | — | — | US | disclosed |
| EP-0945470-A1 | Preparation process of acrylic acid ester polymer | KURARAY CO., LTD. (JP) | 1999-09-29 | — | — | EP | disclosed |