Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CRHBP | P24387 | 1/20 | 0.52 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.52 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.51 |
| ▸ | CES2 | O00748 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.49 |
| ▸ | TP53 | P04637 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | TSHR | P16473 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.47 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.47 |
| ▸ | GRM8 | O00222 | 1/20 | 0.46 |
| ▸ | GRM4 | Q14833 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | ACP3 | P15309 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8744250 | 0.87 | ALDH1A1 (0.58) | MAP2K1CES2ALDH1A1GPR35MAPK1 | |
| SCHEMBL9682909 | 0.84 | CRHBP (0.42) | CRHBPCRHR2MAP2K1ALDH1A1GPR35 | |
| SCHEMBL14744514 | 0.83 | ALDH1A1 (0.47) | CRHBPCRHR2ALDH1A1HSP90AA1TDP1 | |
| SCHEMBL31633570 | 0.82 | CYP1A2 (0.56) | CRHBPCRHR2ALDH1A1GPR35MAPK1 | |
| SCHEMBL5583438 | 0.82 | CYP1A2 (0.56) | CRHBPCRHR2ALDH1A1GPR35MAPK1 | |
| SCHEMBL11740225 | 0.81 | ALDH1A1 (0.51) | CRHBPCRHR2ALDH1A1GPR35MAPK1 | |
| SCHEMBL3379925 | 0.81 | ALDH1A1 (0.47) | CRHBPCRHR2MAP2K1ALDH1A1TSHR | |
| SCHEMBL14744361 | 0.80 | ALDH1A1 (0.44) | CRHBPCRHR2ALDH1A1TDP1ACP3 | |
| SCHEMBL6556910 | 0.80 | LMNA (0.50) | ALDH1A1MAPK1TP53HPGDTSHR | |
| SCHEMBL1813716 | 0.78 | CA12 (0.58) | CRHBPCRHR2CES2ALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0155231-B2 | Image-producing process | CIBA GEIGY AG (CH) | 1997-01-15 | — | — | EP | disclosed |
| US-5508141-A | AQUEOUS ACIDIC PHOTORESIST EMULSION CONTAINING RESIN, POSITIVE-ACTING PHOTOACTIVE FUNCTIONALITY, ACID, OXIDIZING AGENT, SURFACTANT | W. R. GRACE & CO.-CONN. (US) | 1996-04-16 | — | — | US | disclosed |
| EP-0468002-A4 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | GRACE W R & CO (US) | 1995-08-09 | — | — | EP | disclosed |
| US-5232815-A | Corrosion resistance | W. R. GRACE & CO.-CONN. (US) | 1993-08-03 | — | — | US | disclosed |
| EP-0337258-B1 | LIGHT SENSITIVE COMPOSITIONS FOR LIGHT SENSITIVE COATING MATERIALS AND PROCESSES FOR OBTAINING RELIEF PATTERNS AND IMAGES | BASF Aktiengesellschaft (DE) | 1993-06-23 | — | — | EP | disclosed |
| EP-0518453-A1 | A method of making electrical circuit traces | W.R. Grace & Co.-Conn. (US) | 1992-12-16 | — | — | EP | disclosed |
| EP-0277555-B1 | COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND PROCESS FOR PREPARING TWO-LAYER RESISTS AND SEMICONDUCTOR DEVICES | BASF Aktiengesellschaft (DE) | 1992-04-08 | — | — | EP | disclosed |
| EP-0468002-A1 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | W.R. GRACE & CO.-CONN. (US) | 1992-01-29 | — | — | EP | disclosed |
| EP-0271010-B1 | COPOLYMERS WITH 0-NITROCARBINOL ESTER GROUPS, AND THEIR USE | BASF Aktiengesellschaft (DE) | 1991-12-11 | — | — | EP | disclosed |
| WO-1991008840-A1 | AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES | W.R. GRACE & CO.-CONN. (US) | 1991-06-27 | — | — | WO | disclosed |
| US-4822866-A | PLASMA RESISTANT PHOTORESISTS; REMOVABLE WITH WEAK ALKALINE SOLUTIONS | BASF AKTIENGESELLSCHAFT (DE) | 1989-04-18 | — | — | US | disclosed |
| US-4812542-A | PHOTORESISTS, LIGHT-SENSITIVE COATINGS | BASF AKTIENGESELLSCHAFT (DE) | 1989-03-14 | — | — | US | disclosed |
| US-4808682-A | BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND | BASF AKTIENGESELLSCHAFT (DE) | 1989-02-28 | — | — | US | disclosed |
| EP-0277555-A2 | Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices | BASF Aktiengesellschaft (DE) | 1988-08-10 | — | — | EP | disclosed |
| EP-0271010-A2 | Copolymers with 0-nitrocarbinol ester groups, and their use | BASF Aktiengesellschaft (DE) | 1988-06-15 | — | — | EP | disclosed |
| US-4632900-A | Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface | CIBA-GEIGY CORPORATION (US) | 1986-12-30 | — | — | US | disclosed |
| EP-0155231-A2 | Image-producing process | CIBA-GEIGY AG (CH) | 1985-09-18 | — | — | EP | disclosed |