SCHEMBL8770575

SCHEMBL8770575

CCc1ccccc1[Si](O[Cr](=O)(=O)O[Si](c1ccccc1CC)(c1ccccc1CC)c1ccccc1CC)(c1ccccc1CC)c1ccccc1CC

nearest known ligand 0.35

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 1/20 0.35
ADRA2B P18089 1/20 0.35
ADRA2C P18825 1/20 0.35
GABRA1 P14867 2/20 0.34
GABRB2 P47870 2/20 0.34
MAPT P10636 3/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
NPSR1 Q6W5P4 1/20 0.34
MGLL Q99685 1/20 0.32
TAAR1 Q96RJ0 2/20 0.31
HTR1A P08908 1/20 0.31
CYP4F2 P78329 1/20 0.31
CYP4A11 Q02928 1/20 0.31
NISCH Q9Y2I1 1/20 0.30
MEN1 O00255 1/20 0.30
LMNA P02545 1/20 0.30
KMT2A Q03164 1/20 0.30
HPGD P15428 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6908442 0.76 TSHR (0.36) MEN1KMT2AHPGD
SCHEMBL3396227 0.73 GABRA1 (0.35) ADRA2AADRA2BADRA2CGABRA1GABRB2
SCHEMBL12441757 0.70 GABRA1 (0.42) GABRA1GABRB2MAPTL3MBTL1NPSR1
SCHEMBL669702 0.69 GABRA1 (0.38) ADRA2AADRA2BADRA2CGABRA1GABRB2
SCHEMBL1562731 0.69 GABRA1 (0.38) GABRA1GABRB2MAPTL3MBTL1NPSR1
SCHEMBL7028689 0.69 TRPA1 (0.34) MAPTATM
SCHEMBL9617750 0.69 GABRA1 (0.41) GABRA1GABRB2MAPTL3MBTL1NPSR1
SCHEMBL1686677 0.69 GABRA1 (0.46) GABRA1GABRB2MAPTL3MBTL1NPSR1
SCHEMBL1686693 0.69 GABRA1 (0.46) GABRA1GABRB2MAPTL3MBTL1NPSR1
SCHEMBL10709160 0.69 GABRA1 (0.41) GABRA1GABRB2MAPTL3MBTL1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0626256-B1 Hollow multi-layer molding MITSUBISHI CHEM CORP (JP) 1997-08-06 EP claimed
US-5443874-A Laminate including high molecular weight polyethylene formed with reducing agent and silyl chromate catalyst, barrier layer of polyamide, saponified ethylene-vinyl acetate, thermoplastic polyester or blend, adhesive of acid-modified polyethylene MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1995-08-22 US claimed
EP-0626256-A1 Hollow multi-layer molding MITSUBISHI CHEMICAL CORPORATION (JP) 1994-11-30 EP claimed
EP-0626256-B1 Hollow multi-layer molding MITSUBISHI CHEM CORP (JP) 1997-08-06 EP disclosed
US-5443874-A Laminate including high molecular weight polyethylene formed with reducing agent and silyl chromate catalyst, barrier layer of polyamide, saponified ethylene-vinyl acetate, thermoplastic polyester or blend, adhesive of acid-modified polyethylene MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1995-08-22 US disclosed
EP-0626256-A1 Hollow multi-layer molding MITSUBISHI CHEMICAL CORPORATION (JP) 1994-11-30 EP disclosed