Water

Water

SCHEMBL8773033

Cc1cccc(C)c1S(=O)(=O)O.O.O

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE known ✓ P22303 1/20 0.36
ALDH1A1 P00352 5/20 0.42
TDP1 Q9NUW8 4/20 0.40
KDM4E B2RXH2 2/20 0.40
POLB P06746 1/20 0.40
APEX1 P27695 1/20 0.40
TSHR P16473 4/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
CYP1A2 P05177 1/20 0.38
CYP2A6 P11509 1/20 0.38
KEAP1 Q14145 1/20 0.38
NFE2L2 Q16236 1/20 0.38
TRPA1 O75762 2/20 0.37
ATM Q13315 1/20 0.37
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
HSD17B10 Q99714 3/20 0.35
HPGD P15428 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL183903 0.97 ALDH1A1 (0.43) ALDH1A1TDP1KDM4EPOLBAPEX1
SCHEMBL27764997 0.95 ALDH1A1 (0.42) ALDH1A1TDP1KDM4EPOLBAPEX1
SCHEMBL27841017 0.95 ALDH1A1 (0.42) ALDH1A1TDP1KDM4EPOLBAPEX1
SCHEMBL11076120 0.95 ALDH1A1 (0.42) ALDH1A1TDP1KDM4EPOLBAPEX1
Hydrochloric Acid SCHEMBL8629651 0.95 ALDH1A1 (0.42) ALDH1A1TDP1KDM4EPOLBAPEX1
Benzene SCHEMBL28947691 0.95 TDP1 (0.44) ALDH1A1TDP1KDM4EPOLBAPEX1
Iodide SCHEMBL27949560 0.95 ALDH1A1 (0.42) ALDH1A1TDP1KDM4EPOLBAPEX1
Fluoromethane SCHEMBL27938455 0.93 ALDH1A1 (0.40) ALDH1A1TDP1KDM4EPOLBAPEX1
Propane SCHEMBL27908241 0.91 ALDH1A1 (0.39) ALDH1A1TDP1KDM4EPOLBAPEX1
SCHEMBL153279 0.86 MYC (0.46) ALDH1A1TDP1KDM4EPOLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11643573-B2 Polishing composition, production method therefor, and polishing method and production method for substrate, using polishing composition FUJIMI INCORPORATED (JP) 2023-05-09 US disclosed
CN-110431209-B Polishing composition, method for producing same, polishing method using same, and method for producing substrate 福吉米株式会社 2022-06-28 CN disclosed
US-20210139739-A1 POLISHING COMPOSITION, PRODUCTION METHOD THEREFOR, AND POLISHING METHOD USING POLISHING COMPOSITION, AND PRODUCTION METHOD FOR SUBSTRATE FUJIMI INCORPORATED (JP) 2021-05-13 US disclosed
CN-110431209-A Composition for polishing, its manufacturing method and using its grinding method and substrate manufacturing method FUJIMI INC 2019-11-08 CN disclosed
EP-0383995-B1 Aromatic thermosetting resins and preparation thereof SUMIKIN CHEMICAL (JP) 1997-10-15 EP disclosed
US-5017683-A Organic acid catalyst SUMIKIN CHEMICAL CO., LTD. (JP) 1991-05-21 US disclosed
US-4115439-A Process for the preparation of optically active α-phenylglycine and intermediates thereof NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1978-09-19 US disclosed
US-3936451-A Process for producing salts of hexamethylenetetramine UNITED STATES PIPE AND FOUNDRY COMPANY (US) 1976-02-03 US disclosed