SCHEMBL8773535

SCHEMBL8773535

CC(C)OC(=O)OCc1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.58
TSHR P16473 1/20 0.58
TDP1 Q9NUW8 2/20 0.52
MAPK1 P28482 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
SLC6A2 P23975 1/20 0.52
SLC6A3 Q01959 1/20 0.52
KMT2A Q03164 1/20 0.52
LMNA P02545 2/20 0.47
HCAR2 Q8TDS4 1/20 0.47
ATM Q13315 1/20 0.47
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
MAPT P10636 1/20 0.45
HPGD P15428 1/20 0.45
ELANE P08246 1/20 0.44
CTSK P43235 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Formaldehyde SCHEMBL28509807 0.96 ALDH1A1 (0.55) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL10645335 0.87 ALDH1A1 (0.56) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL10645330 0.87 ALDH1A1 (0.56) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL6814027 0.86 TSHR (0.51) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL16805831 0.86 ALDH1A1 (0.51) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL6156217 0.86 TSHR (0.55) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL6643657 0.86 ALDH1A1 (0.55) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL12412848 0.86 ALDH1A1 (0.55) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL1484984 0.86 ALDH1A1 (0.55) ALDH1A1TSHRTDP1MAPK1L3MBTL1
SCHEMBL10426175 0.86 ALDH1A1 (0.55) ALDH1A1TSHRTDP1MAPK1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4383945-A 4-Substituted-2-oxoazetidine compounds and processes for the preparation thereof FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1983-05-17 US claimed
EP-0073451-A2 Carbapenam compound and processes for the preparation thereof FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1983-03-09 EP claimed
US-20260069734-A1 FRESHENING COMPOSITIONS COMPRISING CONTROLLED RELEASE MODULATORS ARYLESSENCE INC (US) 2026-03-12 US disclosed
WO-2023173227-A1 C4-SUBSTITUTED TRYPTAMINE DERIVATIVES AND METHODS OF USING Enveric Biosciences Canada Inc. (CA) 2023-09-21 WO disclosed
US-11732093-B2 Cross polymers composed of polysaccharides and polyamino acids, and uses thereof POLYPEPTIDE THERAPEUTIC SOLUTIONS S.L. (ES) 2023-08-22 US disclosed
US-20230165843-A1 USE AND PHARMACEUTICAL COMPOSITION OF PHENYLISOXAZOLYL METHYLENE-NAPHTHALENE-ETHER DERIVATIVES GANNEX PHARMA CO LTD (CN) 2023-06-01 US disclosed
US-9766547-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2017-09-19 US disclosed
US-9760003-B2 Pattern forming method and actinic-ray- or radiation-sensitive resin composition FUJIFILM CORPORATION (JP) 2017-09-12 US disclosed
US-9760003-B2 Pattern forming method and actinic-ray- or radiation-sensitive resin composition FUJIFILM CORPORATION (JP) 2017-09-12 US disclosed
US-9709892-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9557643-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device FUJIFILM CORPORATION (JP) 2017-01-31 US disclosed
US-20120282548-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-11-08 US disclosed
EP-0511948-B1 Preparation of urethane and carbonate products MONSANTO CO (US) 1997-11-05 EP disclosed
US-5371183-A Reacting diamine or polyamine with carbon dioxide in solvent in presence of sterically hindered amidine or guanidine to form salt, reacting with hydrocarbyl dihalide or polyhalide in polar aprotic solvent, polymerizing product MONSANTO COMPANY (US) 1994-12-06 US disclosed
US-5349048-A Reaction of carbon dioxide with alcohol to form salt in solvent and reacting with hydrocarbyl halide MONSANTO COMPANY (US) 1994-09-20 US disclosed
US-5344934-A Reaction of carbon dioxide and amine in aprotic solvents MONSANTO COMPANY (US) 1994-09-06 US disclosed
US-5260473-A Reaction of alcohol and carbon dioxide in aprotic solvent and strong amidine or guanidine base MONSANTO COMPANY (US) 1993-11-09 US disclosed
EP-0556538-A1 Blocked tricarbamate compounds MONSANTO COMPANY (US) 1993-08-25 EP disclosed
US-5223638-A Reacting primary or secondary amine with carbon dioxide in presence of strong amidine or guanidine base to form ammonium carbamate salt, reacting in polar aprotic solvent with primary or secondary hydrocarbyl halide MONSANTO COMPANY (US) 1993-06-29 US disclosed
EP-0511948-A2 Preparation of urethane and carbonate products MONSANTO COMPANY (US) 1992-11-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230165843-A1 USE AND PHARMACEUTICAL COMPOSITION OF PHENYLISOXAZOLYL METHYLENE-NAPHTHALENE-ETHER DERIVATIVES VIM, CYP3A7, HAVCR2 ALDH1A1 681/4885TSHR 4238/4885TDP1 4496/4885
US-11732093-B2 Cross polymers composed of polysaccharides and polyamino acids, and uses thereof CD44, CUTA, PARG ALDH1A1 2246/4885TSHR 3476/4885TDP1 2738/4885
US-20120282548-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM RAD51, RER1, RXRA ALDH1A1 2723/4885TSHR 2059/4885TDP1 588/4885
US-20260069734-A1 FRESHENING COMPOSITIONS COMPRISING CONTROLLED RELEASE MODULATORS FFAR1, FFAR2, FFAR3 ALDH1A1 697/4885TSHR 1822/4885TDP1 4632/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.