SCHEMBL8896484

SCHEMBL8896484

C=C(C)C(=O)OCCS(=O)(=O)c1ccc(C)cc1

nearest known ligand 0.50

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.50
CYP3A4 P08684 1/20 0.50
CYP2C9 P11712 1/20 0.50
CYP2C19 P33261 1/20 0.50
KMT2A Q03164 6/20 0.49
LMNA P02545 1/20 0.47
GAA P10253 1/20 0.45
NPC1 O15118 1/20 0.44
PAX8 Q06710 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15502162 0.92 THRB (0.46) ALDH1A1CYP3A4CYP2C9CYP2C19KMT2A
SCHEMBL15502182 0.92 THRB (0.46) ALDH1A1CYP3A4CYP2C9CYP2C19KMT2A
SCHEMBL14578756 0.89 ALDH1A1 (0.58) ALDH1A1CYP3A4CYP2C9CYP2C19KMT2A
SCHEMBL9555297 0.88 KMT2A (0.48) ALDH1A1KMT2ALMNAGAAPAX8
SCHEMBL29323726 0.87 ALDH1A1 (0.41) ALDH1A1CYP3A4CYP2C9CYP2C19KMT2A
SCHEMBL1130280 0.86 MAPT (0.47) LMNACA2
SCHEMBL30159652 0.84 ALDH1A1 (0.49) ALDH1A1KMT2ALMNACA1CA2
SCHEMBL4067415 0.84 ALDH1A1 (0.56) ALDH1A1CYP3A4CYP2C9CYP2C19KMT2A
SCHEMBL13415064 0.84 LMNA (0.46) ALDH1A1KMT2ALMNAGAA
SCHEMBL11794391 0.83 CA1 (0.46) ALDH1A1CYP2C9KMT2ALMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023161325-A1 OPHTHALMIC DEVICES BAUSCH + LOMB IRELAND LIMITED (IE) 2023-08-31 WO disclosed
US-20230266505-A1 OPHTHALMIC DEVICES JPMORGAN CHASE BANK, N.A., AS SUCCESSOR AGENT 2023-08-24 US disclosed
US-20230266505-A1 OPHTHALMIC DEVICES JPMORGAN CHASE BANK, N.A., AS SUCCESSOR AGENT 2023-08-24 US disclosed
CN-108351593-B Additive for resist underlayer film forming composition, and resist underlayer film forming composition containing same 日产化学工业株式会社 2021-10-26 CN disclosed
US-10795261-B2 Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-10-06 US disclosed
US-20190317405-A1 ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-10-17 US disclosed
US-10067423-B2 Additive and resist underlayer film-forming composition containing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-09-04 US disclosed
US-20170108777-A1 ADDITIVE AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-04-20 US disclosed
US-9068099-B2 Hydrophobic coatings that provide renewable hydrophilic surface EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2015-06-30 US disclosed
US-20140194573-A1 HYDROPHOBIC COATINGS THAT PROVIDE RENEWABLE HYDROPHILIC SURFACE EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2014-07-10 US disclosed
WO-2014081425-A1 HYDROPHOBIC COATINGS THAT PROVIDE RENEWABLE HYDROPHILIC SURFACE EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2014-05-30 WO disclosed
EP-0550998-B1 Antifouling coating composition HITACHI CHEMICAL CO LTD (JP) 1997-11-19 EP disclosed
US-5550202-A STORAGE STABILITY; LONG LASTING HITACHI CHEMICAL CO., LTD. (JP) 1996-08-27 US disclosed
US-5356979-A Addition polymers for underwater structures HITACHI CHEMICAL COMPANY, LTD. (JP) 1994-10-18 US disclosed
EP-0550998-A1 Coating resin and antifouling coating composition HITACHI CHEMICAL COMPANY, LTD. (JP) 1993-07-14 EP disclosed
US-4933268-A OXONOL DYE HAVING PYRAZOLONE NUCLEUS FUJI PHOTO FILM CO., LTD. (JP) 1990-06-12 US disclosed
EP-0310017-A2 Silver halide photographic materials FUJI PHOTO FILM CO., LTD. (JP) 1989-04-05 EP disclosed
US-4374924-A CATIONIC POLYMERS COMPRISING QUATERNIZED COPOLYMERS OF P-DIVINYLBENZENE OR A DIACRYLIC ESTER AND AN AMINO-CONTAINING ACRYLIC ESTER OR AMIDE FUJI PHOTO FILM CO., LTD. (JP) 1983-02-22 US disclosed
US-4312940-A FOR ACID DYES; REMOVABLE DURING ALKALINE PROCESSING FUJI PHOTO FILM CO., LTD. (JP) 1982-01-26 US disclosed