Morpholine

Morpholine

SCHEMBL8910017

C1COCCN1.Cc1ccc(C(=S)C(C)C)cc1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.41
KMT2A Q03164 5/20 0.37
MEN1 O00255 4/20 0.37
CYP2D6 P10635 2/20 0.37
ADRB1 P08588 1/20 0.36
ALDH1A1 P00352 2/20 0.36
FAAH O00519 1/20 0.36
MGLL Q99685 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
KDM4E B2RXH2 1/20 0.34
GAA P10253 1/20 0.34
CYP2C9 P11712 1/20 0.34
MAPT P10636 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
GABRD O14764 1/20 0.33
GABRA1 P14867 1/20 0.33
GABRB1 P18505 1/20 0.33
GABRA5 P31644 1/20 0.33
GABRA3 P34903 1/20 0.33
GABRA2 P47869 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1713136 0.80 ALDH1A1 (0.44) LMNAKMT2AMEN1ALDH1A1GAA
4-Methylbenzoic Acid SCHEMBL28030084 0.75 ALDH1A1 (0.61) LMNAKMT2AMEN1CYP2D6ALDH1A1
Morpholine SCHEMBL27991330 0.71 CYP2D6 (0.45) LMNAKMT2AMEN1CYP2D6ALDH1A1
Morpholine SCHEMBL27848478 0.70 PTGS2 (0.45) LMNAALDH1A1CYP2C9
Morpholine SCHEMBL7697197 0.70 MEN1 (0.44) KMT2AMEN1CYP2D6ADRB1KDM4E
Morpholine SCHEMBL4270671 0.70 ACHE (0.54) KMT2AMEN1CYP2D6ADRB1ALDH1A1
Morpholine SCHEMBL28059733 0.69 ALDH1A1 (0.42) KMT2AMEN1ADRB1ALDH1A1FAAH
Toluene SCHEMBL3946837 0.69 LMNA (0.50) LMNAKMT2AMEN1ADRB1KDM4E
Morpholine SCHEMBL27881753 0.67 ACHE (0.58) KMT2AMEN1ADRB1KDM4EGAA
Morpholine SCHEMBL28321548 0.67 ADRB1 (0.41) LMNAKMT2AMEN1ADRB1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5645973-A Process for adjusting the sensitivity to radiation of photopolymerizable compositions CIBA-GEIGY CORPORATION (US) 1997-07-08 US disclosed
US-5573889-A Process for adjusting the sensitivity to radiation of photopolymerizable compositions CIBA-GEIGY CORPORATION (US) 1996-11-12 US disclosed
US-4849320-A Method of forming images CIBA-GEIGY CORPORATION (US) 1989-07-18 US disclosed