SCHEMBL8927975

SCHEMBL8927975

O=C(OCC(F)(F)S(=O)(=O)O)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2217884 0.83 PRKCA (0.35) ALDH1A1L3MBTL1
SCHEMBL15071771 0.83 ALDH1A1 (0.32) ALDH1A1L3MBTL1
SCHEMBL8927971 0.83 ALDH1A1 (0.32) ALDH1A1L3MBTL1
SCHEMBL501596 0.82 PRKCA (0.34) ALDH1A1L3MBTL1
SCHEMBL683677 0.79 CYP4F2 (0.32)
SCHEMBL15219007 0.78 LMNA (0.39) ALDH1A1L3MBTL1HTT
SCHEMBL14228085 0.78 ALDH1A1 (0.34) ALDH1A1L3MBTL1HTT
SCHEMBL687031 0.78 ALDH1A1 (0.37) ALDH1A1L3MBTL1HTT
SCHEMBL11917849 0.78
SCHEMBL21505268 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8187790-B2 Polymer for resist and resist composition manufactured using the same KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-05-29 US disclosed
US-20100081079-A1 POLYMER FOR RESIST AND RESIST COMPOSITION MANUFACTURED USING THE SAME KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-04-01 US disclosed