Sugi Predict

Sugi Predict / Compounds / SCHEMBL893422

SCHEMBL893422

SCHEMBL893422

O=C(OCCCCC(F)(F)C(F)(F)S(=O)(=O)O[PH](c1ccccc1)(c1ccccc1)c1ccccc1)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.39
▸ GAA P10253 2/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.38
▸ RECQL P46063 1/20 0.37
▸ CYP17A1 P05093 2/20 0.37
▸ CYP19A1 P11511 2/20 0.37
▸ LMNA P02545 1/20 0.36
▸ KDM4E B2RXH2 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ CYP3A4 P08684 1/20 0.35
▸ CYP2D6 P10635 1/20 0.35
▸ CYP2C9 P11712 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ P2RX4 Q99571 1/20 0.33
▸ P2RX7 Q99572 1/20 0.33
▸ POLB P06746 1/20 0.32
▸ TSHR P16473 1/20 0.32
▸ MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1771531 0.85 ALDH1A1 (0.39) ALDH1A1GAASMN1; SMN2RECQLCYP17A1
SCHEMBL515759 0.83 ALDH1A1 (0.43) ALDH1A1GAASMN1; SMN2RECQLCYP17A1
SCHEMBL17068032 0.80 NPSR1 (0.38) ALDH1A1GAACYP17A1CYP19A1LMNA
SCHEMBL1771529 0.80 ALDH1A1 (0.39) ALDH1A1GAASMN1; SMN2RECQLCYP17A1
SCHEMBL893421 0.80 ALDH1A1 (0.41) ALDH1A1GAASMN1; SMN2RECQLCYP17A1
SCHEMBL515758 0.79 ALDH1A1 (0.39) ALDH1A1GAASMN1; SMN2RECQLCYP17A1
SCHEMBL9999741 0.78 ALDH1A1 (0.38) ALDH1A1GAASMN1; SMN2CYP17A1CYP19A1
SCHEMBL19459382 0.77 ALDH1A1 (0.37) ALDH1A1GAASMN1; SMN2CYP17A1CYP19A1
SCHEMBL14241050 0.77 ALDH1A1 (0.37) ALDH1A1GAASMN1; SMN2CYP17A1CYP19A1
SCHEMBL12556616 0.77 ALDH1A1 (0.39) ALDH1A1SMN1; SMN2CYP17A1CYP19A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2485090-B1 Radiation-sensitive resin composition for forming resist pattern JSR CORP (JP) 2020-12-23 — — EP disclosed
US-20190094691-A1 RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2019-03-28 — — US disclosed
US-20190033713-A1 RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2019-01-31 — — US disclosed
US-10025188-B2 Resist pattern-forming method JSR CORPORATION (JP) 2018-07-17 — — US disclosed
US-20180017864-A9 PATTERN-FORMING METHOD JSR CORPORATION (JP) 2018-01-18 — — US disclosed
US-20170322492-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-11-09 — — US disclosed
US-20170184960-A1 PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-06-29 — — US disclosed
US-20160320705-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-11-03 — — US disclosed
US-20160097978-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2016-04-07 — — US disclosed
US-9268219-B2 Photoresist composition and resist pattern-forming method JSR CORPORATION (JP) 2016-02-23 — — US disclosed
US-20120308938-A1 METHOD FOR FORMING PATTERN AND DEVELOPER JSR CORPORATION (JP) 2012-12-06 — — US disclosed
EP-2530525-A1 Method for forming pattern and developer JSR Corporation (JP) 2012-12-05 — — EP disclosed
US-20120276482-A1 RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND JSR CORPORATION (JP) 2012-11-01 — — US disclosed
US-20120258402-A1 PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND JSR CORPORATION (JP) 2012-10-11 — — US disclosed
US-20120237876-A1 RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-09-20 — — US disclosed
US-20120202150-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-08-09 — — US disclosed
EP-2485090-A1 Radiation-sensitive resin composition for forming resist pattern JSR Corporation (JP) 2012-08-08 — — EP disclosed
US-20120183908-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2012-07-19 — — US disclosed
EP-2444845-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2012-04-25 — — EP disclosed
US-20120082936-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-04-05 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120276482-A1 RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND RAD51, MRE11, RER1 ALDH1A1 1414/4885GAA 1276/4885SMN1; SMN2 2675/4885
US-20120258402-A1 PHOTORESIST COMPOSITION, RESIST-PATTERN FORMING METHOD, POLYMER, AND COMPOUND FRG1, NPY4R, RER1 ALDH1A1 2682/4885GAA 4737/4885SMN1; SMN2 4601/4885
US-20120237876-A1 RADIATION-SENSITIVE RESIN COMPOSITION, MONOMER, POLYMER, AND PRODUCTION METHOD OF RADIATION-SENSITIVE RESIN COMPOSITION RAD51, RAD54L, MRE11 ALDH1A1 2031/4885GAA 4151/4885SMN1; SMN2 3236/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.