Water

Water

SCHEMBL8942498

CCCCC1(N)CCCCC1(CCCC)CCCC.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6061497 0.98
Bromide SCHEMBL7781771 0.96
Hydrochloric Acid SCHEMBL7780863 0.96
SCHEMBL3670420 0.90
SCHEMBL28185897 0.88
SCHEMBL3670419 0.88
SCHEMBL1539043 0.84 LMNA (0.30)
SCHEMBL3668901 0.84
SCHEMBL3671234 0.82
SCHEMBL3674291 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111825103-B Fluorine-containing high-silicon Y molecular sieve and preparation method thereof 中国科学院大连化学物理研究所 2022-04-12 CN claimed
CN-111825102-B Dry glue conversion synthesis method of high-silicon Y molecular sieve 中国科学院大连化学物理研究所 2022-03-22 CN claimed
CN-111825102-A Dry glue conversion synthesis method of high-silicon Y molecular sieve 中国科学院大连化学物理研究所 2020-10-27 CN claimed
CN-111825103-A Fluorine-containing high-silicon Y molecular sieve and preparation method thereof 中国科学院大连化学物理研究所 2020-10-27 CN claimed
CN-111825100-A High-silicon Y molecular sieve with FAU topological structure and preparation method thereof 中国科学院大连化学物理研究所 2020-10-27 CN claimed
JP-8176594-A None JP disclosed
US-12481218-B2 Treatment liquid, method for washing substrate, and method for removing resist FUJIFILM CORPORATION (JP) 2025-11-25 US disclosed
US-12386265-B2 Pattern forming method and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2025-08-12 US disclosed
US-12276915-B2 Treatment liquid and treatment method FUJIFILM CORPORATION (JP) 2025-04-15 US disclosed
US-12097996-B2 Container, method for manufacturing container, and chemical liquid storage body FUJIFILM CORPORATION (JP) 2024-09-24 US disclosed
US-20240295822-A1 PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-09-05 US disclosed
US-20240231237-A9 TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMOVING RESIST FUJIFILM CORPORATION (JP) 2024-07-11 US disclosed
CN-111825102-A Dry glue conversion synthesis method of high-silicon Y molecular sieve 中国科学院大连化学物理研究所 2020-10-27 CN disclosed
CN-111825103-A Fluorine-containing high-silicon Y molecular sieve and preparation method thereof 中国科学院大连化学物理研究所 2020-10-27 CN disclosed
CN-111825100-A High-silicon Y molecular sieve with FAU topological structure and preparation method thereof 中国科学院大连化学物理研究所 2020-10-27 CN disclosed
US-20200115105-A1 CONTAINER, METHOD FOR MANUFACTURING CONTAINER, AND CHEMICAL LIQUID STORAGE BODY FUJIFILM CORPORATION (JP) 2020-04-16 US disclosed
CN-110770137-A Container, method for manufacturing container, and chemical liquid container 富士胶片株式会社 2020-02-07 CN disclosed
US-20190079409-A1 TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMOVING RESIST FUJIFILM CORPORATION (JP) 2019-03-14 US disclosed
US-20190025702-A1 TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2019-01-24 US disclosed
JP-H08176594-A CLEANER FOR SEALING ELEMENT MITSUBISHI CHEM CORP 1996-07-09 JP disclosed