SCHEMBL8946082

SCHEMBL8946082

O=C(O)CCc1cccc2c1O2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGER1 P34995 4/20 0.46
PTGER4 P35408 4/20 0.46
PTGER3 P43115 4/20 0.46
PTGER2 P43116 4/20 0.46
PARP1 P09874 1/20 0.44
KEAP1 Q14145 1/20 0.44
FFAR1 O14842 4/20 0.41
NPSR1 Q6W5P4 1/20 0.41
MTNR1A P48039 3/20 0.39
ALDH1A1 P00352 1/20 0.38
POLB P06746 1/20 0.38
MAPT P10636 1/20 0.38
PKM P14618 1/20 0.38
HTT P42858 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
HDAC3 O15379 1/20 0.37
MAPK1 P28482 1/20 0.37
ADRA1A P35348 1/20 0.37
HDAC4 P56524 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5997602 0.82 MAOA (0.46) PTGER1PTGER4PTGER3PTGER2PARP1
SCHEMBL30684116 0.81 AKR1B1 (0.50) MAPTTDP1ADRA1A
SCHEMBL166877 0.81 KDM4C (0.51) PTGER1PTGER4PTGER3PTGER2PARP1
SCHEMBL3430852 0.80 MTNR1A (0.62) PTGER1PTGER4PTGER3PTGER2MTNR1A
SCHEMBL11174190 0.76 AHR (0.38) MTNR1ATDP1
SCHEMBL4021521 0.75 KMT2A (0.39) PTGER1PTGER4PTGER3PTGER2KEAP1
SCHEMBL59198 0.75 KEAP1 (0.65) PTGER1PTGER4PTGER3PTGER2PARP1
SCHEMBL27571225 0.75 PARP1 (0.42) PTGER1PTGER4PTGER3PTGER2PARP1
SCHEMBL5696745 0.74 PARP1 (0.69) PTGER1PTGER4PTGER3PTGER2PARP1
SCHEMBL8479546 0.73 MTNR1A (0.61) PTGER1PTGER4PTGER3PTGER2FFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5580702-A COMPRISING A PHOTOSENSITIVE ACID-GENERATING COMPOUND AND A COPOLYMER OF P-HYDROXYSTYRENE AND AN ESTER OF P-CARBOXYMETHOXYSTYRENE; NONTOXIC; STEEP WALLS; HIGH SPEED; SEMICONDUCTORS KABUSHIKI KAISHA TOSHIBA (JP) 1996-12-03 US disclosed
US-5403695-A Photolithography; high resolution; semiconductors KABUSHIKI KAISHA TOSHIBA (JP) 1995-04-04 US disclosed