SCHEMBL8947485

SCHEMBL8947485

O=C1c2c(Cl)cccc2Cc2c(Cl)cc3ccccc3c21

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 1/20 0.38
CYP1A2 P05177 2/20 0.37
CYP2A6 P11509 1/20 0.37
MAPT P10636 4/20 0.36
ALOX5 P09917 2/20 0.36
ALDH1A1 P00352 2/20 0.36
MEN1 O00255 1/20 0.36
USP2 O75604 1/20 0.36
HPN P05981 1/20 0.36
CYP3A4 P08684 1/20 0.36
THRB P10828 1/20 0.36
ALOX15 P16050 1/20 0.36
TSHR P16473 1/20 0.36
PTGS1 P23219 1/20 0.36
PDE4A P27815 1/20 0.36
KDR P35968 1/20 0.36
KMT2A Q03164 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
SIRT5 Q9NXA8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8383288 0.88 ALOX5 (0.43) CES1CYP1A2CYP2A6MAPTALOX5
SCHEMBL11041196 0.81 CYP2A6 (0.44) CES1CYP1A2CYP2A6MAPTALOX5
SCHEMBL11398974 0.78 CA1 (0.41) CES1ALOX5L3MBTL1APAF1AHR
SCHEMBL7103871 0.76 TSHR (0.57) CES1CYP1A2CYP2A6MAPTALOX5
SCHEMBL11661126 0.74 L3MBTL1 (0.39) CYP1A2CYP2A6MAPTALOX5ALDH1A1
SCHEMBL11663709 0.74 CES1 (0.38) CES1CYP1A2MAPTALOX5ALDH1A1
SCHEMBL11799939 0.72 ACHE (0.43) CES1CYP1A2ALDH1A1MEN1KMT2A
Anthracene SCHEMBL28843478 0.72 MAOA (0.52) CES1CYP1A2MAPTALOX5ALDH1A1
SCHEMBL7029795 0.70 NSD2 (0.40) CES1MAPTALOX5ALDH1A1MEN1
SCHEMBL29522447 0.68 MAOA (0.61) CES1CYP1A2MAPTALOX5ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4083725-A CINNAMIC ACID PHOTOSENSITIVE RESIN AND A HALOGEN SUBSTITUTED BENZANTHRONE SENSITIZER MITSUBISHI CHEMICAL INDUSTRIES LTD. (JA) 1978-04-11 US claimed
US-5550002-A EXPOSING TO LIGHT PHOTOHARDENABLE PHOTOSENSITIVE LAYER ON LIGHT-SENSITIVE PLATE, APPLYING HEAT OR PRESSURE, REMOVING EXPOSED LAYER, EXPOSING UNEXPOSED LAYER TO HARDEN KONICA CORPORATION (JP) 1996-08-27 US disclosed
US-4684601-A UNSATURATED, HIGH MOLECULAR WEIGHT DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-08-04 US disclosed
US-4640887-A C,M UNSATURATED POLYESTERS WITH FREE CARBOXY GROUPS; PRINTING DURABLE PLATES WITH IMPROVED OLEOPHILICITY DAINIPPON INK AND CHEMICALS, INC. (JP) 1987-02-03 US disclosed
US-4591545-A Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender DAINIPPON INK AND CHEMICALS, INC. (JP) 1986-05-27 US disclosed
EP-0071236-B1 PHOTOSENSITIVE LITHOGRAPHIC PLATE MITSUBISHI KASEI CORPORATION (JP) 1986-04-23 EP disclosed
US-4421841-A UNSATURATED POLYESTERS MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1983-12-20 US disclosed
EP-0071236-A1 Photosensitive lithographic plate MITSUBISHI KASEI CORPORATION (JP) 1983-02-09 EP disclosed
EP-0009223-B1 PHOTOSENSITIVE COMPOSITION MITSUBISHI KASEI CORPORATION (JP) 1982-11-10 EP disclosed
US-4258124-A Photosensitive composition MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) 1981-03-24 US disclosed
US-4083725-A CINNAMIC ACID PHOTOSENSITIVE RESIN AND A HALOGEN SUBSTITUTED BENZANTHRONE SENSITIZER MITSUBISHI CHEMICAL INDUSTRIES LTD. (JA) 1978-04-11 US disclosed