SCHEMBL895396

SCHEMBL895396

C=C(OC(=C)C12CC3CC(CC(C3)C1)C2)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.36
HSD11B1 P28845 4/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
ITGB1 P05556 2/20 0.35
ITGA4 P13612 2/20 0.35
MAPT P10636 2/20 0.34
GAA P10253 2/20 0.34
XBP1 P17861 1/20 0.34
LMNA P02545 3/20 0.33
SLC22A2 O15244 1/20 0.33
SLC22A1 O15245 1/20 0.33
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
TSHR P16473 1/20 0.33
NFKB1 P19838 1/20 0.33
STAT6 P42226 1/20 0.33
GRIN1 Q05586 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33
GRIN2C Q14957 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8779286 0.84 GLA (0.39) GLAHSD11B1L3MBTL1ITGB1ITGA4
SCHEMBL6346843 0.80 EPHX2 (0.43) HSD11B1L3MBTL1MAPTGAAXBP1
SCHEMBL3947819 0.75 LMNA (0.50) GAALMNATSHRALDH1A1MEN1
SCHEMBL7735475 0.72 HSD11B1 (0.38) GLAHSD11B1L3MBTL1ITGB1ITGA4
SCHEMBL3755487 0.72 HSD11B1 (0.38) GLAHSD11B1L3MBTL1ITGB1ITGA4
SCHEMBL6451090 0.70 ALDH1A1 (0.39) GLAHSD11B1L3MBTL1MAPTLMNA
SCHEMBL16415960 0.70 HSD11B1 (0.39) GLAHSD11B1ITGB1ITGA4LMNA
SCHEMBL6378192 0.68 MAPT (0.52) GLAHSD11B1L3MBTL1MAPTGAA
SCHEMBL11899772 0.66 SCN1A (0.41) GLAHSD11B1MAPTGAAXBP1
SCHEMBL1088117 0.65 GLA (0.42) GLAHSD11B1L3MBTL1ITGB1ITGA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6951705-B2 Polymers for photoresist compositions for microlithography E. I. DU PONT DE NEMOURS AND COMPANY (US) 2005-10-04 US claimed
US-20030211417-A1 Polymers for photoresist compositions for microlithography DUPONT ELECTRONICS, INC. 2003-11-13 US claimed
EP-1279069-A2 POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2003-01-29 EP claimed
WO-2001086352-A2 POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-11-15 WO claimed
EP-2436665-B1 PROCESS FOR PRODUCING VINYL ETHER NIPPON CARBIDE KOGYO KK (JP) 2015-07-08 EP disclosed
US-9000228-B2 Method for producing vinyl ether NIPPON CARBIDE INDUSTRIES CO., LTD. (JP) 2015-04-07 US disclosed
US-8530134-B2 Process for producing photoresist polymeric compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2013-09-10 US disclosed
US-20120083628-A1 METHOD FOR PRODUCING VINYL ETHER NIPPON CARBIDE INDUSTRIES CO., INC. (JP) 2012-04-05 US disclosed
US-20100297551-A1 PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-25 US disclosed
US-6951705-B2 Polymers for photoresist compositions for microlithography E. I. DU PONT DE NEMOURS AND COMPANY (US) 2005-10-04 US disclosed
US-20030211417-A1 Polymers for photoresist compositions for microlithography DUPONT ELECTRONICS, INC. 2003-11-13 US disclosed
EP-1279069-A2 POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2003-01-29 EP disclosed
WO-2001086352-A2 POLYMERS FOR PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY E.I. DU PONT DE NEMOURS AND COMPANY (US) 2001-11-15 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120083628-A1 METHOD FOR PRODUCING VINYL ETHER AGXT, CYP2E1, TGM1 GLA 81/4885HSD11B1 470/4885L3MBTL1 2200/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.