SCHEMBL8990017

SCHEMBL8990017

C(=Cc1ccccc1)[SiH2]O[SiH2]C=Cc1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 2/20 0.48
TRPA1 O75762 2/20 0.46
NFE2L2 Q16236 1/20 0.46
CYP19A1 P11511 1/20 0.46
MAOA P21397 1/20 0.46
RELA Q04206 3/20 0.42
ALDH1A1 P00352 2/20 0.41
LMNA P02545 2/20 0.41
ALOX5 P09917 1/20 0.41
MAPK1 P28482 1/20 0.41
CYP1A2 P05177 2/20 0.41
CYP1A1 P04798 1/20 0.41
CYP1B1 Q16678 1/20 0.41
IDO1 P14902 2/20 0.40
HDAC3 O15379 1/20 0.39
TNKS O95271 1/20 0.39
HDAC4 P56524 1/20 0.39
HDAC1 Q13547 1/20 0.39
HCAR2 Q8TDS4 1/20 0.39
HDAC7 Q8WUI4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3372078 0.87 TRPA1 (0.45) MAOBTRPA1NFE2L2CYP19A1MAOA
SCHEMBL3916137 0.81 MAOB (0.44) MAOBTRPA1NFE2L2CYP19A1MAOA
SCHEMBL1468384 0.81 TRPA1 (0.48) MAOBTRPA1NFE2L2RELAALDH1A1
SCHEMBL1468386 0.81 TRPA1 (0.48) MAOBTRPA1NFE2L2RELAALDH1A1
SCHEMBL2367510 0.80 MAOB (0.40) MAOBTRPA1NFE2L2CYP19A1MAOA
SCHEMBL5472329 0.76 TRPA1 (0.39) MAOBTRPA1NFE2L2RELAALDH1A1
SCHEMBL17239119 0.76 HTR2A (0.40) MAOBTRPA1LMNAMAPK1CYP2D6
SCHEMBL28352752 0.76 TRPA1 (0.39) MAOBTRPA1NFE2L2CYP19A1MAOA
SCHEMBL1470879 0.76 RELA (0.48) MAOBTRPA1MAOARELAALDH1A1
SCHEMBL27722650 0.76 TRPA1 (0.39) MAOBTRPA1NFE2L2RELAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0492256-B1 Photolithographic patterning SIEMENS AG (DE) 1996-08-14 EP disclosed
EP-0453610-B1 Process for obtaining resist structures SIEMENS AG (DE) 1996-06-26 EP disclosed
US-5262283-A Method for producing a resist structure SIEMENS AKTIENGESELLSCHAFT (DE) 1993-11-16 US disclosed
EP-0492256-A1 Photolithographic patterning SIEMENS AKTIENGESELLSCHAFT (DE) 1992-07-01 EP disclosed
EP-0453610-A1 Process for obtaining resist structures SIEMENS AKTIENGESELLSCHAFT (DE) 1991-10-30 EP disclosed