SCHEMBL8990044

SCHEMBL8990044

C=C(C(=O)OC[SiH3])C(C)(C)C

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1896769 0.79 ALDH1A1 (0.48) TSHR
SCHEMBL8744223 0.77 ALDH1A1 (0.47) TSHR
SCHEMBL28791986 0.77 TSHR (0.44) TSHR
SCHEMBL29117402 0.77 TSHR (0.30) TSHR
SCHEMBL2786173 0.77 THRB (0.37) TSHR
SCHEMBL16319849 0.76 ALDH1A1 (0.32) TSHR
SCHEMBL6854268 0.76 PAM (0.34) TSHR
SCHEMBL352637 0.74 ALDH1A1 (0.36) TSHR
SCHEMBL534164 0.74 THRB (0.34) TSHR
SCHEMBL22545152 0.74 THRB (0.57) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0447111-B1 Resist composition and pattern formation process FUJITSU LTD (JP) 1996-07-17 EP disclosed
US-5153103-A RESIST COMPOSITION AND PATTERN FORMATION PROCESS FUJITSU LIMITED (JP) 1992-10-06 US disclosed
EP-0447111-A1 Resist composition and pattern formation process FUJITSU LIMITED (JP) 1991-09-18 EP disclosed