SCHEMBL9006486

SCHEMBL9006486

FC(F)=C(F)Oc1ccc(C=Cc2ccc(Cl)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 2/20 0.44
AHR P35869 2/20 0.44
CYP1A2 P05177 1/20 0.41
MAOB P27338 3/20 0.41
ALOX5 P09917 1/20 0.41
PTGS1 P23219 1/20 0.41
NFE2L2 Q16236 1/20 0.41
MAOA P21397 1/20 0.41
PPARA Q07869 1/20 0.39
MEN1 O00255 2/20 0.39
LMNA P02545 2/20 0.39
TP53 P04637 2/20 0.39
CYP3A4 P08684 2/20 0.39
MAPT P10636 2/20 0.39
KMT2A Q03164 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
KDM4E B2RXH2 1/20 0.39
TTR P02766 1/20 0.39
CYP2D6 P10635 1/20 0.38
PKM P14618 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006482 1.00 PTGS2 (0.44) PTGS2AHRCYP1A2MAOBALOX5
SCHEMBL9006474 0.90 KDM4E (0.44) PTGS2AHRCYP1A2ALOX5PTGS1
SCHEMBL9006467 0.90 KDM4E (0.44) PTGS2AHRCYP1A2ALOX5PTGS1
SCHEMBL9006511 0.87 CYP1A2 (0.64) CYP1A2MAOBMAOAMEN1LMNA
SCHEMBL9006503 0.87 CYP1A2 (0.64) CYP1A2MAOBMAOAMEN1LMNA
SCHEMBL9006421 0.83 APP (0.50) PTGS2CYP1A2MAOBALOX5PTGS1
SCHEMBL9006417 0.83 APP (0.50) PTGS2CYP1A2MAOBALOX5PTGS1
SCHEMBL9006778 0.83 NFE2L2 (0.55) PTGS2ALOX5PTGS1NFE2L2KMT2A
SCHEMBL9006773 0.83 NFE2L2 (0.55) PTGS2ALOX5PTGS1NFE2L2KMT2A
SCHEMBL9006667 0.81 NFE2L2 (0.58) PTGS2AHRCYP1A2ALOX5PTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed