SCHEMBL9006773

SCHEMBL9006773

FC(F)=C(F)Oc1ccc(/C=C/c2ccc(F)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 8/20 0.55
PTGS1 P23219 2/20 0.50
NQO2 P16083 1/20 0.46
HSD11B1 P28845 1/20 0.42
ALOX5 P09917 1/20 0.42
PTGS2 P35354 1/20 0.42
KMT2A Q03164 1/20 0.41
APP P05067 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006778 1.00 NFE2L2 (0.55) NFE2L2PTGS1NQO2HSD11B1ALOX5
SCHEMBL9006474 0.92 KDM4E (0.44) NFE2L2PTGS1NQO2ALOX5PTGS2
SCHEMBL9006467 0.92 KDM4E (0.44) NFE2L2PTGS1NQO2ALOX5PTGS2
SCHEMBL9006689 0.87 HSD11B1 (0.66) NFE2L2HSD11B1KMT2A
SCHEMBL9006693 0.87 HSD11B1 (0.66) NFE2L2HSD11B1KMT2A
SCHEMBL9006421 0.85 APP (0.50) NFE2L2PTGS1NQO2ALOX5PTGS2
SCHEMBL9006417 0.85 APP (0.50) NFE2L2PTGS1NQO2ALOX5PTGS2
SCHEMBL9006486 0.83 PTGS2 (0.44) NFE2L2PTGS1ALOX5PTGS2KMT2A
SCHEMBL9006482 0.83 PTGS2 (0.44) NFE2L2PTGS1ALOX5PTGS2KMT2A
SCHEMBL9006667 0.83 NFE2L2 (0.58) NFE2L2PTGS1NQO2ALOX5PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed