SCHEMBL9006474

SCHEMBL9006474

FC(F)=C(F)Oc1ccc(C=Cc2ccc(OC(F)=C(F)F)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.44
LMNA P02545 2/20 0.44
KMT2A Q03164 2/20 0.44
TTR P02766 2/20 0.44
MEN1 O00255 1/20 0.44
TP53 P04637 1/20 0.44
CYP3A4 P08684 1/20 0.44
MAPT P10636 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
NFE2L2 Q16236 1/20 0.42
CYP1A1 P04798 2/20 0.39
PTGS1 P23219 2/20 0.39
PTGS2 P35354 2/20 0.39
CYP1B1 Q16678 2/20 0.39
ALOX12 P18054 1/20 0.39
RELA Q04206 2/20 0.39
TRPA1 O75762 1/20 0.39
RAD51 Q06609 1/20 0.38
ESR1 P03372 2/20 0.38
TUBB4A P04350 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006467 1.00 KDM4E (0.44) KDM4ELMNAKMT2ATTRMEN1
SCHEMBL9006417 0.92 APP (0.50) KDM4ELMNAKMT2ATTRMEN1
SCHEMBL9006773 0.92 NFE2L2 (0.55) KMT2ANFE2L2PTGS1PTGS2NQO2
SCHEMBL9006778 0.92 NFE2L2 (0.55) KMT2ANFE2L2PTGS1PTGS2NQO2
SCHEMBL9006421 0.92 APP (0.50) KDM4ELMNAKMT2ATTRMEN1
SCHEMBL9006482 0.90 PTGS2 (0.44) KDM4ELMNAKMT2ATTRMEN1
SCHEMBL9006667 0.90 NFE2L2 (0.58) KDM4ELMNATTRTP53CYP3A4
SCHEMBL9006669 0.90 NFE2L2 (0.58) KDM4ELMNATTRTP53CYP3A4
SCHEMBL9006486 0.90 PTGS2 (0.44) KDM4ELMNAKMT2ATTRMEN1
SCHEMBL9282488 0.88 LMNA (0.53) KDM4ELMNAKMT2ATTRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed