SCHEMBL9006417

SCHEMBL9006417

Oc1ccc(/C=C/c2ccc(OC(F)=C(F)F)cc2)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 6/20 0.50
KDM4E B2RXH2 4/20 0.50
CYP1A1 P04798 4/20 0.50
PTGS2 P35354 4/20 0.50
CYP1B1 Q16678 4/20 0.50
PTGS1 P23219 4/20 0.50
MEN1 O00255 3/20 0.50
MAPT P10636 3/20 0.50
KMT2A Q03164 3/20 0.50
LMNA P02545 3/20 0.50
TTR P02766 3/20 0.50
ALOX5 P09917 3/20 0.50
NQO2 P16083 3/20 0.50
CA12 O43570 2/20 0.50
CA1 P00915 2/20 0.50
CA2 P00918 2/20 0.50
CA3 P07451 2/20 0.50
CA4 P22748 2/20 0.50
CA6 P23280 2/20 0.50
CA5A P35218 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006421 1.00 APP (0.50) APPKDM4ECYP1A1PTGS2CYP1B1
SCHEMBL9006467 0.92 KDM4E (0.44) KDM4ECYP1A1PTGS2CYP1B1PTGS1
SCHEMBL9006474 0.92 KDM4E (0.44) KDM4ECYP1A1PTGS2CYP1B1PTGS1
SCHEMBL1505923 0.88 MEN1 (0.48) APPKDM4EPTGS2PTGS1MEN1
SCHEMBL9006742 0.87 F3 (0.62) PTGS2MEN1MAPTKMT2ACA12
SCHEMBL9006741 0.87 F3 (0.62) PTGS2MEN1MAPTKMT2ACA12
SCHEMBL9006778 0.85 NFE2L2 (0.55) APPPTGS2PTGS1KMT2AALOX5
SCHEMBL9006773 0.85 NFE2L2 (0.55) APPPTGS2PTGS1KMT2AALOX5
SCHEMBL9006667 0.83 NFE2L2 (0.58) KDM4ECYP1A1PTGS2CYP1B1PTGS1
SCHEMBL9006486 0.83 PTGS2 (0.44) KDM4EPTGS2PTGS1MEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed