SCHEMBL9011982

SCHEMBL9011982

[N-]=[N+]=C(S(=O)(=O)c1ccc(Cl)c(Cl)c1)S(=O)(=O)c1ccc(Cl)c(Cl)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APEX1 P27695 1/20 0.42
FLT1 P17948 2/20 0.40
FLT4 P35916 2/20 0.40
KDR P35968 2/20 0.40
MAOA P21397 1/20 0.38
MAOB P27338 1/20 0.38
ALDH1A1 P00352 2/20 0.38
NFE2L2 Q16236 1/20 0.36
PTGES2 Q9H7Z7 1/20 0.36
RAB9A P51151 1/20 0.36
MMP2 P08253 1/20 0.36
MMP9 P14780 1/20 0.36
CCR2 P41597 1/20 0.36
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA4 P22748 1/20 0.36
CA6 P23280 1/20 0.36
CA5A P35218 1/20 0.36
CA7 P43166 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547494 0.80 ALDH1A1 (0.48) FLT1FLT4KDRALDH1A1MMP2
SCHEMBL9010804 0.78 PGR (0.44) FLT1FLT4KDRALDH1A1NFE2L2
SCHEMBL6934019 0.76 LMNA (0.50) ALDH1A1RAB9ALMNA
SCHEMBL18316 0.74 APEX1 (0.50) APEX1FLT1FLT4KDRMAOA
SCHEMBL29515977 0.74 LMNA (0.52) RAB9ACA1CA2CA9LMNA
SCHEMBL384239 0.74 LMNA (0.52) RAB9ACA1CA2CA9LMNA
SCHEMBL9010861 0.74 MCL1 (0.46) ALDH1A1LMNAMAPT
SCHEMBL11973784 0.74 MAPT (0.44) FLT1FLT4KDRALDH1A1MMP2
SCHEMBL14650732 0.73 MAPT (0.48) ALDH1A1RAB9ACA12CA1CA2
SCHEMBL474108 0.73 APEX1 (0.48) APEX1FLT1FLT4KDRMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0417557-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5338641-A Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-16 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417557-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed