SCHEMBL9010875

SCHEMBL9010875

N#Cc1ccc(C(=O)C(=[N+]=[N-])S(=O)(=O)c2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.46
ALDH1A1 P00352 3/20 0.42
KMT2A Q03164 3/20 0.42
KDM4E B2RXH2 1/20 0.42
PKM P14618 1/20 0.42
ATM Q13315 1/20 0.42
TAS2R14 Q9NYV8 1/20 0.41
KAT6A Q92794 2/20 0.41
LMNA P02545 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
MAOA P21397 1/20 0.40
MAOB P27338 1/20 0.40
CYP11B1 P15538 1/20 0.39
CYP11B2 P19099 1/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
MEN1 O00255 2/20 0.37
NPC1 O15118 1/20 0.37
KEAP1 Q14145 1/20 0.37
NFE2L2 Q16236 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9010805 0.86 CYP11B1 (0.43) ALDH1A1KMT2ATAS2R14LMNAMAOA
SCHEMBL546386 0.85 CES2 (0.45) MAPTALDH1A1KMT2AATMKAT6A
SCHEMBL8637821 0.81 KMT2A (0.53) MAPTALDH1A1KMT2ALMNAL3MBTL1
SCHEMBL384366 0.81 CES2 (0.51) MAPTALDH1A1KMT2ALMNAL3MBTL1
SCHEMBL9010850 0.81 CA2 (0.49) ALDH1A1KMT2ACA1CA2MEN1
SCHEMBL9015170 0.78 ALDH1A1 (0.55) MAPTALDH1A1KMT2ALMNAL3MBTL1
SCHEMBL9010827 0.78 ALDH1A1 (0.57) MAPTALDH1A1KMT2ATAS2R14MAOB
SCHEMBL9010800 0.76 CES2 (0.53) MAPTALDH1A1KMT2AKDM4EPKM
SCHEMBL384364 0.75 CES2 (0.51) MAPTALDH1A1KMT2ALMNAL3MBTL1
SCHEMBL3975777 0.73 SMN1; SMN2 (0.42) MAPTALDH1A1KMT2AATMLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0417556-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5340682-A Sensitive, heat resistant, noncorrosive HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-23 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417556-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed