Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | FOLH1 | Q04609 | 2/20 | 0.34 |
| ▸ | BID | P55957 | 6/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 6/20 | 0.32 |
| ▸ | BCL2L1 | Q07817 | 5/20 | 0.32 |
| ▸ | BAK1 | Q16611 | 5/20 | 0.32 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.32 |
| ▸ | PPARG | P37231 | 2/20 | 0.32 |
| ▸ | PPARA | Q07869 | 2/20 | 0.32 |
| ▸ | SAE1 | Q9UBE0 | 2/20 | 0.32 |
| ▸ | EP300 | Q09472 | 1/20 | 0.32 |
| ▸ | KAT2A | Q92830 | 1/20 | 0.32 |
| ▸ | KAT2B | Q92831 | 1/20 | 0.32 |
| ▸ | KAT5 | Q92993 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 2/20 | 0.31 |
| ▸ | F7 | P08709 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9109026 | 1.00 | POLB (0.34) | POLBAPEX1HTTTDP1FOLH1 | |
| SCHEMBL36344 | 0.87 | POLB (0.43) | POLBAPEX1HTTTDP1FOLH1 | |
| Itaconate SCHEMBL2638844 | 0.81 | HTT (0.37) | POLBAPEX1HTTTDP1FOLH1 | |
| SCHEMBL5442445 | 0.80 | POLB (0.47) | POLBAPEX1HTTTDP1FOLH1 | |
| SCHEMBL5441216 | 0.79 | POLB (0.49) | POLBAPEX1HTTTDP1FOLH1 | |
| SCHEMBL4946808 | 0.78 | THRB (0.44) | POLBAPEX1HTTTDP1THRB | |
| SCHEMBL297292 | 0.78 | THRB (0.44) | POLBAPEX1HTTTDP1THRB | |
| SCHEMBL94668 | 0.78 | THRB (0.44) | POLBAPEX1HTTTDP1THRB | |
| SCHEMBL6323141 | 0.78 | FOLH1 (0.58) | POLBAPEX1HTTTDP1FOLH1 | |
| SCHEMBL28623616 | 0.76 | THRB (0.43) | POLBAPEX1HTTTDP1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3702387-B1 | PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-10 | — | — | EP | disclosed |
| US-11142629-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-12 | — | — | US | disclosed |
| US-10890845-B2 | Chemically amplified positive-type photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-01-12 | — | — | US | disclosed |
| EP-3702387-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR ETCHING GLASS SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-09-02 | — | — | EP | disclosed |
| US-10599036-B2 | Chemically amplified positive-type photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-03-24 | — | — | US | disclosed |
| US-20190300674-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-10-03 | — | — | US | disclosed |
| US-10261415-B2 | Chemically amplified positive-type photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-16 | — | — | US | disclosed |
| US-20180259853-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-9981914-B2 | — | — | 2018-05-29 | — | — | US | disclosed |
| US-20170285476-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9557651-B2 | Chemically amplified positive-type photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-01-31 | — | — | US | disclosed |
| US-9448478-B2 | Chemically amplified positive-type photosensitive resin composition for thick-film application | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-20 | — | — | US | disclosed |
| US-9244354-B2 | Method for producing thick film photoresist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | disclosed |
| US-20150268553-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-24 | — | — | US | disclosed |
| US-20150268557-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR THICK-FILM APPLICATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-24 | — | — | US | disclosed |
| US-9091916-B2 | Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20130230801-A1 | POSITIVE-TYPE PHOTORESIST COMPOSITION, PHOTORESIST LAMINATE, METHOD FOR PRODUCING PHOTORESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-05 | — | — | US | disclosed |
| US-20130171572-A1 | METHOD FOR PRODUCING THICK FILM PHOTORESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20120141940-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM, AND METHOD FOR PRODUCING THICK FILM RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | SLC9A2, SLC9A1, NHERF1 | POLB 2120/4885APEX1 365/4885HTT 311/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.