SCHEMBL915656

SCHEMBL915656

CCC(C)OP(=O)(O)Cc1cc(C(=O)OC)cc(C(=O)OC)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.46
LMNA P02545 3/20 0.43
ALDH1A1 P00352 5/20 0.40
GAA P10253 2/20 0.39
KDM4E B2RXH2 4/20 0.38
DUSP3 P51452 1/20 0.38
PTPN5 P54829 1/20 0.38
PTPN11 Q06124 1/20 0.38
SLC7A5 Q01650 2/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
LOXL2 Q9Y4K0 1/20 0.36
PRKCA P17252 2/20 0.36
PRKCD Q05655 2/20 0.36
MEN1 O00255 1/20 0.36
HPGD P15428 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915374 0.87 LOXL2 (0.51) ALDH1A1KDM4ESLC7A5LOXL2HPGD
SCHEMBL915305 0.86 LOXL2 (0.46) HSD17B10ALDH1A1GAAKDM4ECA12
SCHEMBL914197 0.86 MEN1 (0.35) ALDH1A1KDM4EPRKCAPRKCDMEN1
SCHEMBL915113 0.83 LOXL2 (0.43) CA12CA1CA2CA9CA14
SCHEMBL915746 0.81 KDM4E (0.46) HSD17B10LMNAALDH1A1GAAKDM4E
SCHEMBL1976119 0.78 KMT2A (0.34) ALDH1A1GAAKDM4EKMT2APOLB
SCHEMBL914653 0.78 KDM4E (0.48) HSD17B10LMNAALDH1A1GAAKDM4E
SCHEMBL915492 0.77 PGK1 (0.50) HSD17B10LMNAALDH1A1GAAKDM4E
SCHEMBL915155 0.76 FOLH1 (0.47) NFKB1NFKB2RELA
SCHEMBL915768 0.74 ALDH1A1 (0.46) ALDH1A1KDM4EMEN1KMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed