SCHEMBL914720

SCHEMBL914720

CCOP(=O)(O)Cc1ccc(C(=O)c2ccc(O)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.47
ESR2 Q92731 2/20 0.47
HTT P42858 2/20 0.47
LMNA P02545 2/20 0.47
MAPT P10636 2/20 0.47
PKM P14618 1/20 0.47
HPGD P15428 1/20 0.47
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA7 P43166 1/20 0.45
CA9 Q16790 1/20 0.45
CA14 Q9ULX7 1/20 0.45
HDAC1 Q13547 1/20 0.42
SRD5A2 P31213 1/20 0.42
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
MAPK1 P28482 1/20 0.41
ELANE P08246 1/20 0.41
CETP P11597 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915441 0.90 PPARD (0.44) ESR1ESR2LMNACA12CA1
SCHEMBL914759 0.88 SRD5A2 (0.49) HDAC1SRD5A2CETPALDH1A1
SCHEMBL914846 0.88 MAPT (0.47) ESR1ESR2HTTLMNAMAPT
Butane SCHEMBL27659367 0.87 POLB (0.41) ESR1ESR2LMNACA12CA1
SCHEMBL915108 0.85 HDAC1 (0.42) ESR1ESR2CA12CA1CA2
SCHEMBL915285 0.85 PTPN1 (0.50) ESR1ESR2CA12CA1CA2
SCHEMBL916358 0.85 LOXL2 (0.49) LMNAMAPTHPGDCA12CA1
SCHEMBL914859 0.84 ENPP2 (0.51) HPGDCETPALDH1A1
SCHEMBL17488978 0.83 PPARD (0.50) HDAC1CETPSMN1; SMN2TSHRPOLB
SCHEMBL914831 0.83 LTA4H (0.51) ESR1ESR2MEN1KMT2ACETP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed