SCHEMBL915355

SCHEMBL915355

CCOP(=O)(O)Cc1ccc(Oc2ccc(OCCOC)cc2)cc1

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 5/20 0.41
CYP1A2 P05177 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
PPARG P37231 2/20 0.40
PPARD Q03181 2/20 0.40
PPARA Q07869 2/20 0.40
ACACB O00763 1/20 0.39
KDM4E B2RXH2 1/20 0.38
RECQL P46063 1/20 0.38
MAPT P10636 1/20 0.37
S1PR1 P21453 4/20 0.37
S1PR3 Q99500 4/20 0.37
S1PR2 O95136 2/20 0.37
LPAR2 Q9HBW0 2/20 0.37
S1PR4 O95977 2/20 0.37
S1PR5 Q9H228 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916688 0.96 ACACB (0.41) CYP1A2CYP2C19ACACBKDM4ERECQL
SCHEMBL914836 0.91 S1PR1 (0.43) PPARGPPARDPPARAACACBKDM4E
SCHEMBL915717 0.91 PTPN1 (0.43) LTA4HCYP1A2CYP2C9CYP2C19ACACB
SCHEMBL916357 0.89 NR1I2 (0.43) LTA4HPPARGPPARDPPARARECQL
SCHEMBL915137 0.88 L3MBTL1 (0.47) PPARGPPARDPPARAACACBMAPT
SCHEMBL915294 0.88 SMN1; SMN2 (0.37) ACACBKDM4ERECQLMAPTS1PR1
SCHEMBL915546 0.87 GAA (0.44) ACACB
SCHEMBL915837 0.87 KDM4E (0.44) KDM4ES1PR1S1PR3S1PR4S1PR5
SCHEMBL914862 0.85 LTA4H (0.41) LTA4HCYP2C19PPARGPPARDPPARA
SCHEMBL915653 0.85 CYP1A2 (0.43) LTA4HCYP1A2CYP2C9CYP2C19PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed