SCHEMBL915294

SCHEMBL915294

CCOP(=O)(O)Cc1ccc(Sc2ccc(OCCOC)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.37
LMNA P02545 2/20 0.37
THRB P10828 1/20 0.37
ACACB O00763 1/20 0.37
GAA P10253 1/20 0.36
HPGD P15428 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
KDM4E B2RXH2 1/20 0.36
RECQL P46063 1/20 0.36
TP53 P04637 1/20 0.36
MMP2 P08253 1/20 0.36
MMP9 P14780 1/20 0.36
MMP12 P39900 1/20 0.36
S1PR1 P21453 4/20 0.35
S1PR3 Q99500 4/20 0.35
S1PR2 O95136 2/20 0.35
LPAR2 Q9HBW0 2/20 0.35
S1PR4 O95977 2/20 0.35
S1PR5 Q9H228 2/20 0.35
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916688 0.92 ACACB (0.41) SMN1; SMN2LMNAACACBKDM4ERECQL
SCHEMBL914605 0.90 NR1I2 (0.40) SMN1; SMN2LMNATHRBGAAHPGD
SCHEMBL915717 0.88 PTPN1 (0.43) SMN1; SMN2ACACBKDM4ERECQLS1PR1
SCHEMBL914836 0.88 S1PR1 (0.43) ACACBKDM4ERECQLS1PR1S1PR3
SCHEMBL915355 0.88 LTA4H (0.41) ACACBKDM4ERECQLS1PR1S1PR3
SCHEMBL4439215 0.86 SMN1; SMN2 (0.39) SMN1; SMN2LMNATHRBGAAHPGD
SCHEMBL915289 0.86 MMP2 (0.44) SMN1; SMN2LMNATHRBACACBGAA
SCHEMBL915137 0.84 L3MBTL1 (0.47) SMN1; SMN2LMNAACACBGAANPSR1
SCHEMBL915837 0.83 KDM4E (0.44) SMN1; SMN2LMNAGAAKDM4ES1PR1
SCHEMBL915546 0.83 GAA (0.44) SMN1; SMN2LMNAACACBGAANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed