SCHEMBL915544

SCHEMBL915544

COCCOc1ccc(C(=O)c2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.49
L3MBTL1 Q9Y468 5/20 0.49
LMNA P02545 4/20 0.49
PPARG P37231 3/20 0.46
PPARA Q07869 3/20 0.46
PPARD Q03181 1/20 0.46
GAA P10253 3/20 0.45
MAPK1 P28482 1/20 0.45
RAB9A P51151 2/20 0.44
ALDH1A1 P00352 3/20 0.43
HTT P42858 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
ACACB O00763 1/20 0.42
CYP19A1 P11511 1/20 0.41
PKM P14618 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915764 0.91 ENPP2 (0.45) MAPTACACB
SCHEMBL915136 0.87 GAA (0.62) MAPTL3MBTL1LMNAPPARGPPARA
SCHEMBL915416 0.86 CHEK2 (0.42) MAPTPPARGPPARAPPARDACACB
SCHEMBL915653 0.86 CYP1A2 (0.43) MAPTPPARGPPARAPPARDACACB
SCHEMBL915789 0.86 PTPN1 (0.51) MAPTACACB
SCHEMBL31187555 0.86 KDM4E (0.45) MAPTLMNAMAPK1ALDH1A1SMN1; SMN2
SCHEMBL915137 0.86 L3MBTL1 (0.47) MAPTL3MBTL1LMNAPPARGPPARA
SCHEMBL12455672 0.86 MAPT (0.63) MAPTL3MBTL1LMNAPPARGPPARA
SCHEMBL4440821 0.83 GAA (0.45) MAPTL3MBTL1LMNAGAARAB9A
SCHEMBL915289 0.82 MMP2 (0.44) MAPTLMNAGAASMN1; SMN2ACACB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed