SCHEMBL915316

SCHEMBL915316

COCCOc1ccc(S(=O)(=O)c2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 4/20 0.45
MMP9 P14780 3/20 0.45
MMP12 P39900 1/20 0.45
ALDH1A1 P00352 3/20 0.43
PKM P14618 5/20 0.42
LIMK2 P53671 1/20 0.42
GAA P10253 3/20 0.41
NPSR1 Q6W5P4 1/20 0.41
LMNA P02545 3/20 0.40
MMP13 P45452 3/20 0.40
NAMPT P43490 1/20 0.39
TSHR P16473 2/20 0.39
HTT P42858 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
MMP8 P22894 1/20 0.39
MMP14 P50281 1/20 0.39
ACACB O00763 1/20 0.39
CA12 O43570 2/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915764 0.89 ENPP2 (0.45) ACACBMAPT
SCHEMBL914795 0.87 ALDH1A1 (0.44) MMP2MMP9MMP12ALDH1A1PKM
SCHEMBL915546 0.87 GAA (0.44) MMP2MMP9MMP12ALDH1A1PKM
SCHEMBL915653 0.85 CYP1A2 (0.43) ACACBMAPT
SCHEMBL915789 0.85 PTPN1 (0.51) ACACBMAPT
SCHEMBL31187555 0.85 KDM4E (0.45) ALDH1A1LMNASMN1; SMN2ACACBKMT2A
SCHEMBL915416 0.85 CHEK2 (0.42) MMP2MMP9MMP12MMP13ACACB
SCHEMBL4439210 0.84 ALDH1A1 (0.46) MMP2MMP9MMP12ALDH1A1PKM
SCHEMBL915289 0.81 MMP2 (0.44) MMP2MMP9MMP12GAANPSR1
SCHEMBL915544 0.81 MAPT (0.49) ALDH1A1PKMGAALMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed