4-Vinylphenol

4-Vinylphenol

SCHEMBL925059

C1=Cc2cccc3cccc1c23.C=Cc1ccc(O)cc1.C=Cc1ccc(OC(OC)C(C)C)cc1

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
S100B P04271 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547158 0.88 RELA (0.32)
4-Vinylphenol SCHEMBL925066 0.88
4-Vinylphenol SCHEMBL2190252 0.83 S100B (0.46) S100B
4-Vinylphenol SCHEMBL766769 0.80 ALDH1A1 (0.39)
SCHEMBL989083 0.78 ALDH1A1 (0.41)
4-Vinylphenol SCHEMBL503510 0.77 ACHE (0.41)
4-Vinylphenol SCHEMBL2191047 0.76 S100B (0.39) S100B
SCHEMBL925884 0.74 KCNH2 (0.32)
4-Vinylphenol SCHEMBL2193194 0.73 MAOB (0.36)
SCHEMBL2771513 0.73 ABL1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8389201-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-05 US disclosed
US-20110003251-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-06 US disclosed