SCHEMBL925884

SCHEMBL925884

C1=Cc2cccc3cccc1c23.C=Cc1ccc(OCCCCC)cc1.COC(Oc1ccc2c3c(cccc13)C=C2)C(C)C.Oc1ccc2c3c(cccc13)C=C2

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 2/20 0.32
CHRNB4 P30926 2/20 0.31
CHRNA3 P32297 2/20 0.31
CHRNA7 P36544 2/20 0.31
CHRNB2 P17787 1/20 0.31
CHRNA4 P43681 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL927484 0.97 CHRNB2 (0.33) CHRNB4CHRNA3CHRNA7CHRNB2CHRNA4
Indene SCHEMBL927491 0.90
4-Vinylphenol SCHEMBL925066 0.87
SCHEMBL923834 0.82 PPARG (0.33)
4-Vinylphenol SCHEMBL925059 0.74 S100B (0.31)
SCHEMBL547158 0.72 RELA (0.32)
SCHEMBL926416 0.71 PRMT1 (0.32)
SCHEMBL3131329 0.67 NPC1 (0.32)
4-Vinylphenol SCHEMBL2195434 0.65 S100B (0.37) CHRNB4CHRNA3CHRNA7CHRNB2CHRNA4
SCHEMBL21625027 0.64 HTR1B (0.47) KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8389201-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-05 US disclosed
US-20110003251-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-01-06 US disclosed