SCHEMBL9268604

SCHEMBL9268604

COc1ccc(-c2cc[c]cc2OC)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABL1 P00519 1/20 0.42
ABCB1 P08183 1/20 0.42
BCR P11274 1/20 0.42
BACE1 P56817 2/20 0.41
SYK P43405 3/20 0.41
AURKB Q96GD4 1/20 0.41
INCENP Q9NQS7 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA7 P43166 1/20 0.41
CA9 Q16790 1/20 0.41
CA14 Q9ULX7 1/20 0.41
CYP1A1 P04798 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2E1 P05181 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2C8 P10632 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2A6 P11509 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8089506 0.85 ALDH1A1 (0.36) SYKCYP3A4KDM4EMAPTKMT2A
SCHEMBL1644788 0.85 ABL1 (0.42) ABL1ABCB1BCRBACE1SYK
SCHEMBL215578 0.85 ADORA3 (0.43) ABL1ABCB1BCRBACE1SYK
SCHEMBL28510664 0.84 L3MBTL1 (0.38) ABL1ABCB1BCRBACE1SYK
SCHEMBL27272353 0.84 LTA4H (0.50) ABL1ABCB1BCRBACE1SYK
SCHEMBL732756 0.84 SYK (0.39) ABL1ABCB1BCRBACE1SYK
SCHEMBL9416117 0.84 SQOR (0.40) SYKCYP1A1CYP1A2CYP3A4CYP2D6
SCHEMBL27588691 0.84 CHEK1 (0.41) ABL1CYP3A4KDM4ETP53MAPT
SCHEMBL27606299 0.84 MGAM (0.47) ABL1ABCB1BCRESR2KDM4E
SCHEMBL27588559 0.84 KMT2A (0.36) KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11635685-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-25 US disclosed
US-20210149300-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 US disclosed
CN-1553900-A Acylsemicarbazides as cyclin dependent kinase inhibitors useful as anti-cancer and anti-proliferative agents ��ʱ��ʩ����ҩ��˾ 2004-12-08 CN disclosed
US-5461051-A Tetracyclic compounds having anti-allergic and anti-asthmatic activities and their use SANKYO COMPANY, LIMITED (JP) 1995-10-24 US disclosed