SCHEMBL940864

SCHEMBL940864

O=C(O)c1ccc(-c2ccc(C(=O)O)c(C(F)(F)F)c2)cc1C(F)(F)F

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRB P28702 5/20 0.54
RXRA P19793 4/20 0.54
CES2 O00748 2/20 0.52
RXRG P48443 3/20 0.51
KDM4E B2RXH2 2/20 0.48
ALDH1A1 P00352 1/20 0.48
HPGD P15428 1/20 0.48
HSD17B10 Q99714 1/20 0.48
ASPH Q12797 1/20 0.47
HNF4A P41235 2/20 0.47
ACMSD Q8TDX5 2/20 0.47
GFER P55789 1/20 0.47
KMT2A Q03164 1/20 0.47
RXFP1 Q9HBX9 1/20 0.47
KMO O15229 2/20 0.44
KIF11 P52732 1/20 0.43
EPRS1 P07814 1/20 0.43
DHFR P00374 1/20 0.42
MCL1 Q07820 1/20 0.42
CYP1A2 P05177 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31000476 1.00 RXRB (0.54) RXRBRXRACES2RXRGKDM4E
SCHEMBL8920290 0.92 RXRA (0.50) RXRBRXRACES2RXRGKDM4E
SCHEMBL31369064 0.92 ACMSD (0.59) RXRBRXRARXRGHNF4AACMSD
SCHEMBL3582859 0.92 ACMSD (0.59) RXRBRXRARXRGHNF4AACMSD
SCHEMBL272323 0.86 RXRA (0.55) RXRBRXRACES2KDM4EALDH1A1
SCHEMBL8924033 0.85 RXRA (0.50) RXRBRXRACES2RXRGKDM4E
SCHEMBL8923156 0.85 RXRB (0.49) RXRBRXRARXRGKDM4EALDH1A1
SCHEMBL29530817 0.85 MCL1 (0.60) RXRBRXRARXRGKDM4EALDH1A1
SCHEMBL2794241 0.85 MCL1 (0.60) RXRBRXRARXRGKDM4EALDH1A1
SCHEMBL16608991 0.84 KMO (0.54) RXRBRXRARXRGKMOKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240319624-A1 RESIN PARTICLES, TONER, METHOD FOR MANUFACTURING RESIN PARTICLES, IMAGE FORMING APPARATUS, AND METHOD OF FORMING IMAGE RICOH COMPANY, LTD. (JP) 2024-09-26 US disclosed
EP-4174108-B1 RESIN PARTICLE, TONER, DEVELOPER, DEVELOPER STORAGE CONTAINER, RESIN PARTICLE PRODUCING METHOD, TONER PRODUCING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH CO LTD (JP) 2024-09-18 EP disclosed
US-20240288789-A1 RESIN PARTICLE, TONER, DEVELOPING AGENT, DEVELOPING AGENT ACCOMMODATING UNIT, METHOD OF MANUFACTURING RESIN PARTICLE, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2024-08-29 US disclosed
US-20230324823-A1 RESIN PARTICLES, TONER, DEVELOPER, TONER HOUSING UNIT, IMAGE FORMING APPARATUS, AND METHOD OF FORMING IMAGE RICOH COMPANY, LTD. (JP) 2023-10-12 US disclosed
EP-4174108-A1 RESIN PARTICLE, TONER, DEVELOPER, DEVELOPER STORAGE CONTAINER, RESIN PARTICLE PRODUCING METHOD, TONER PRODUCING METHOD, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD Ricoh Company, Ltd. (JP) 2023-05-03 EP disclosed
EP-3418811-B1 TONER, DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD FOR MANUFACTURING TONER RICOH CO LTD (JP) 2021-07-28 EP disclosed
US-10429756-B2 Toner, developer, process cartridge, image forming apparatus, image forming method, and method for manufacturing toner RICOH COMPANY, LTD. (JP) 2019-10-01 US disclosed
EP-3418811-A2 TONER, DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD FOR MANUFACTURING TONER Ricoh Company, Limited (JP) 2018-12-26 EP disclosed
US-20180364600-A1 TONER, DEVELOPER, PROCESS CARTRIDGE, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND METHOD FOR MANUFACTURING TONER RICOH COMPANY, LTD. (JP) 2018-12-20 US disclosed
EP-2702453-B1 ELECTROSTATIC IMAGE DEVELOPING TONER, IMAGE FORMING APPARATUS, IMAGE FORMING METHOD, AND PROCESS CARTRIDGE RICOH CO LTD (JP) 2018-12-12 EP disclosed
EP-1707588-A1 RESIN AND RESIN COMPOSITION Asahi Kasei EMD Corporation (JP) 2006-10-04 EP disclosed
US-20060204882-A1 Toner, toner manufacturing method, developer, image forming apparatus, and process cartridge for the image forming apparatus RICOH COMPANY LIMITED (JP) 2006-09-14 US disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed
US-5670084-A Alignment layer material for liquid crystal display devices HOECHST AKTIENGESELLSCHAFT (DE) 1997-09-23 US disclosed
EP-0708149-A1 Alignment layer material for liquid crystal display devices HOECHST AKTIENGESELLSCHAFT (DE) 1996-04-24 EP disclosed