Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ENPP3 | O14638 | 1/20 | 0.54 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 5/20 | 0.46 |
| ▸ | HTT | P42858 | 3/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.44 |
| ▸ | MAPT | P10636 | 3/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.44 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.44 |
| ▸ | DRD2 | P14416 | 2/20 | 0.43 |
| ▸ | DRD3 | P35462 | 2/20 | 0.43 |
| ▸ | MMP2 | P08253 | 2/20 | 0.43 |
| ▸ | MMP7 | P09237 | 2/20 | 0.43 |
| ▸ | MMP9 | P14780 | 2/20 | 0.43 |
| ▸ | MMP14 | P50281 | 2/20 | 0.43 |
| ▸ | DRD1 | P21728 | 1/20 | 0.43 |
| ▸ | DRD4 | P21917 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10179977 | 0.98 | ENPP3 (0.51) | ENPP3ENPP1LMNAHTTTHRB | |
| SCHEMBL4735791 | 0.83 | SLC18A3 (0.47) | ENPP3ENPP1MMP2MMP7MMP9 | |
| SCHEMBL9957803 | 0.83 | ENPP3 (0.56) | ENPP3ENPP1LMNAHTTTHRB | |
| SCHEMBL107194 | 0.82 | LMNA (0.46) | LMNAHTTTHRBSMN1; SMN2MAPT | |
| SCHEMBL10179695 | 0.81 | ENPP3 (0.54) | ENPP3ENPP1LMNAHTTTHRB | |
| SCHEMBL25316484 | 0.80 | HTT (0.43) | ENPP3ENPP1HTTTHRBSMN1; SMN2 | |
| SCHEMBL9956924 | 0.80 | DRD2 (0.63) | ENPP3ENPP1LMNAHTTSMN1; SMN2 | |
| SCHEMBL15726684 | 0.80 | DRD2 (0.51) | LMNAHTTTHRBSMN1; SMN2MAPT | |
| SCHEMBL9957718 | 0.79 | DRD2 (0.60) | LMNAHTTTHRBSMN1; SMN2MAPT | |
| SCHEMBL10181453 | 0.79 | ENPP3 (0.59) | ENPP3ENPP1LMNAHTTTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9029024-B2 | Nonaqueous electrolyte solution and electrochemical element using same | UBE INDUSTRIES, LTD. (JP) | 2015-05-12 | — | — | US | claimed |
| EP-2469638-B1 | NON-AQUEOUS ELECTROLYTIC SOLUTION AND ELECTROCHEMICAL DEVICE USING THE SAME | UBE INDUSTRIES (JP) | 2014-10-01 | — | — | EP | claimed |
| US-20120189919-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | UBE INDUSTRIES, LTD. (JP) | 2012-07-26 | — | — | US | claimed |
| EP-2469638-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | Ube Industries, Ltd. (JP) | 2012-06-27 | — | — | EP | claimed |
| CN-111066192-A | Nonaqueous electrolyte secondary battery | 三菱化学株式会社 | 2020-04-24 | — | — | CN | disclosed |
| US-10444627-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2019-10-15 | — | — | US | disclosed |
| US-20190196328-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2019-06-27 | — | — | US | disclosed |
| US-10248019-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2019-04-02 | — | — | US | disclosed |
| US-9929376-B2 | Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor | FUJIFILM CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20180051149-A1 | HARDCOAT FILM, POLARIZING PLATE, AND TOUCH PANEL DISPLAY | FUJIFILM CORPORATION (JP) | 2018-02-22 | — | — | US | disclosed |
| US-9880472-B2 | Pattern formation method, pattern, and etching method, electronic device manufacturing method, and electronic device using same | FUJIFILM CORPORATION (JP) | 2018-01-30 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20120219866-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE BATTERY EMPLOYING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219866-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE BATTERY EMPLOYING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120219866-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE BATTERY EMPLOYING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120189919-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | UBE INDUSTRIES, LTD. (JP) | 2012-07-26 | — | — | US | disclosed |
| EP-2475041-A1 | NON-AQUEOUS ELECTROLYTIC SOLUTION, AND NON-AQUEOUS ELECTROLYTE BATTERY COMPRISING SAME | Mitsubishi Chemical Corporation (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2469638-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND ELECTROCHEMICAL ELEMENT USING SAME | Ube Industries, Ltd. (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120135348-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| WO-2011025016-A1 | NON-AQUEOUS ELECTROLYTIC SOLUTION, AND NON-AQUEOUS ELECTROLYTE BATTERY COMPRISING SAME | 三菱化学株式会社 (JP) | 2011-03-03 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10248019-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | ACTR3, RXRA, RARA | ENPP3 1048/4885ENPP1 1458/4885LMNA 1393/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.