Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17857923 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL16743517 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL12212884 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL18872207 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL18138096 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL13105192 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL3464841 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL18872239 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL13483868 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 | |
| SCHEMBL3408381 | 1.00 | SMN1; SMN2 (0.30) | SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220146931-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-12 | — | — | US | disclosed |
| US-11009790-B2 | Photoacid generator and photoresist composition including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-05-18 | — | — | US | disclosed |
| EP-2539316-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2019-10-23 | — | — | EP | disclosed |
| US-10012903-B2 | Resist composition and pattern forming process | SHIN-ESTU CHEMICAL CO., LTD. (JP) | 2018-07-03 | — | — | US | disclosed |
| US-10005868-B2 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-10007178-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| US-20180024435-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20170343898-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-30 | — | — | US | disclosed |
| US-20100167178-A1 | Oxime sulfonates and the use thereof as latent acids | YAMATO HITOSHI | 2010-07-01 | — | — | US | disclosed |
| US-20100167178-A1 | Oxime sulfonates and the use thereof as latent acids | YAMATO HITOSHI | 2010-07-01 | — | — | US | disclosed |
| US-7667050-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-02-23 | — | — | US | disclosed |
| WO-2009150074-A1 | SULFONIUM DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS | BASF SE (DE) | 2009-12-17 | — | — | WO | disclosed |
| US-7625689-B2 | better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-12-01 | — | — | US | disclosed |
| US-7625689-B2 | better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-12-01 | — | — | US | disclosed |
| US-20080187860-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-20080086014-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-10 | — | — | US | disclosed |
| WO-2007147782-A2 | OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS | CIBA HOLDING INC. (CH) | 2007-12-27 | — | — | WO | disclosed |
| US-7232642-B2 | Chemically amplified positive resist composition, a haloester derivative and a process for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-06-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100167178-A1 | Oxime sulfonates and the use thereof as latent acids | HAO2, SULT2A1, ARSA | SMN1; SMN2 3684/4885 |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | PAG1, CCNT1, NAT1 | SMN1; SMN2 4847/4885 |
| US-20220146931-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, FGFR1, CLIC1 | SMN1; SMN2 4113/4885 |
| US-20080086014-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | HCN3, SLC26A3, KCNN4 | SMN1; SMN2 4703/4885 |
| US-11009790-B2 | Photoacid generator and photoresist composition including the same | PAG1, CCNT1, NAT1 | SMN1; SMN2 4847/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.